Double-row sparse planting method for interplanting corn in cornfield
A technology for corn and wheat fields, applied in botany equipment and methods, horticulture, applications, etc., can solve the problems of insufficient utilization of light resources, land resources, and large row spacing, etc., to improve photosynthesis and light energy utilization, and monomer development Robust, Competitive Weakening Effects
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[0012] Such as figure 1 Shown, the double-row sparse planting method of corn of the present invention is: double-row internal spacing a=15cm; double-row and double-row spacing b=65cm, carry out thinning after emergence, stay strong and remove weak, keep flat big ear type spacing c=for 40cm, the distance between the plants of the compact medium panicle type is c=30cm, the distance between the plants of the compact large panicle type is c=35cm, and the staggered seedlings are adopted between the double rows.
[0013] The above-mentioned plant spacing is the average plant spacing of each row.
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