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Substrate supporting apparatus

A technology of equipment and substrates, applied in the direction of electrical components, leather goods holders, sewing equipment, etc.

Inactive Publication Date: 2011-05-18
ADVANCED DISPLAY PROCESS ENG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These processes are performed in equipment with moving parts that could damage or otherwise adversely affect the properties of the final substrate

Method used

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  • Substrate supporting apparatus
  • Substrate supporting apparatus
  • Substrate supporting apparatus

Examples

Experimental program
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Embodiment Construction

[0013] Figure 1a One type of substrate processing apparatus is shown that includes an upper electrode 110 and a lower electrode 120 in a chamber 100 . In operation, a substrate is conveyed (for example by a robot) into the chamber through the gate valve G and placed on the lower electrode. The support apparatus 130 is used to place the substrate on the lower electrode and / or withdraw the substrate from the chamber once processing is complete.

[0014] The substrate supporting apparatus includes a plurality of lift pins 131 passing through the lower electrode, a pin plate 132 provided together with the lift pins, and a lift unit 133 for lifting and lowering the pin plate.

[0015] When the gate valve G is in Figure 1a When open in the state shown, a robotic arm carrying a substrate passes through the gate valve into the chamber. Such as Figure 1b As shown, when the robotic arm enters the chamber, the pin plate 132 is immediately lifted, allowing the lift pins 131 to pass...

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Abstract

A substrate supporting apparatus includes: first and second shafts spaced by a distance that corresponds to or exceeds a width of a substrate; at least one wire to support the substrate, the wire has ends coupled to respective ones of the first and second shafts; and a sensor used for detecting the fracture in the wire. The wire is raised and lowered to place a substrate onto a lower electrode in a substrate processing chamber and to remove the substrate when processing is completed.

Description

technical field [0001] One or more embodiments described herein relate to processing substrates, including semiconductor substrates. Background technique [0002] Semiconductor devices and flat panel displays are fabricated by performing photography, etching, diffusion, deposition, and other processes on substrates. These processes are performed in equipment with moving parts that may damage or otherwise adversely affect the properties of the final substrate. Contents of the invention [0003] According to one aspect of the present invention, there is provided a substrate supporting apparatus comprising: a first axis and a second axis separated by a distance corresponding to or exceeding the width of the substrate; a wire for supporting the substrate, the A wire has an end coupled to a respective one of the first shaft and the second shaft; and a sensor to detect a break in the wire. [0004] According to another aspect of the present invention, there is also provided...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683
CPCH01L21/68742H01L21/68778Y10S269/903H01L21/683
Inventor 孙锡民
Owner ADVANCED DISPLAY PROCESS ENG CO LTD