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Photoinitiator contaning asymmetic hexaaryl bis imidazole and preparation method thereof

A technology of hexaarylbiimidazole and photoinitiator, which is applied in the field of photoinitiator and its preparation, can solve the problems of large usage, low photoinitiation activity, and low solubility, and achieve excellent solubility, high photosensitive performance, and reduce The effect of emissions

Inactive Publication Date: 2009-04-29
CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention aims to solve: the existing photoinitiator has the defects of low solubility, low photoinitiation activity and large usage during use; serious photoinitiated migration phenomenon occurs, and there are many residues, which easily cause problems such as film blurring and environmental pollution.

Method used

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  • Photoinitiator contaning asymmetic hexaaryl bis imidazole and preparation method thereof
  • Photoinitiator contaning asymmetic hexaaryl bis imidazole and preparation method thereof
  • Photoinitiator contaning asymmetic hexaaryl bis imidazole and preparation method thereof

Examples

Experimental program
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Effect test

example 1

[0026] A) Synthesis of Benzoin

[0027] The reaction was carried out in a one-liter four-neck flask equipped with a stirrer, reflux concentration equipment, and nitrogen protection. The reactant feed is shown in the table below:

[0028] Table 1 The synthesis feed list of benzoin

[0029] raw material Quantity (grams) Benzaldehyde 264 (2.5mols) Methanol 225ml water 65ml potassium cyanide 10

[0030] The reaction system was protected with nitrogen, and the reaction mixture was refluxed for 45 minutes, then cooled, and the four-neck flask was cooled with an ice bath to precipitate crystals. The precipitated crystals were filtered, washed with a mixture of 175 ml of methanol and 25 ml of water, washed with 1000 ml of water, and then recrystallized with ethanol. Obtain benzoin product 235g, yield>95%, melting point 134~136 ℃, product purity>98%.

[0031]

[0032] The structural formula of benzoin

[0033] B) Synthesis of 3,4-dimethox...

example 2

[0088] A) Synthesis of Benzoin

[0089] The reaction was carried out in a one-liter four-neck flask equipped with a stirrer, reflux concentration equipment, and nitrogen protection. The reactant feed is shown in the table below:

[0090] Table 11 Synthetic feed list of benzoin

[0091] raw material Quantity (grams) Benzaldehyde 264 (2.5mols) Methanol 225ml water 65ml potassium cyanide 10

[0092] The reaction system was protected with nitrogen, and the reaction mixture was refluxed for 45 minutes, then cooled, and the four-neck flask was cooled with an ice bath to precipitate crystals. The precipitated crystals were filtered, washed with a mixture of 175 ml of methanol and 25 ml of water, washed with 1000 ml of water, and then recrystallized with ethanol. Obtain benzoin product 235g, yield>95%, melting point 134~136 ℃, product purity>98%.

[0093] B) Synthesis of 3,4-diethoxy-2'-chloro-benzoin

[0094] Table 12 3,4-diethoxy-2'-chlor...

example 3

[0138] The produced mixture containing asymmetric hexaarylbiimidazole was applied to photocurable ink. The formula of photocurable ink is as follows:

[0139] Table 21 Formula table of photocurable ink

[0140]

[0141] The mixture formed by formula I can also be cured in visible light, has strong absorption of ultraviolet-visible light, and has high sensitivity; the mixture of formula II can only be cured under the irradiation of ultraviolet lamps, and has low sensitivity. The photoinitiator mixture containing the asymmetric hexaarylbiimidazole greatly improves the sensitivity of the photocurable ink and effectively saves energy consumption.

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Abstract

The invention discloses a photoinitiator containing asymmetric hexa-aryl diimidazole and a preparation method thereof. The invention mainly solves the problems that a photoinitiator containing symmetric hexa-aryl diimidazole is not sensitive to long-wave ultraviolet light and visible light during a photo-curing process; and the residual photoinitiator is migrated to the surface of photoresist material after photo-curing to form an atomization phenomenon, thereby impacting the quality, and production, use environment and the like of a photoresist product, and restricting the application of the photoinitiator in the field of microelectronic material. The preparation method adopts the main raw materials of 3, 4-dialkoxy benzaldehyde, benzaldehyde, and the benzaldehyde having the substituent of fluorine or chlorine atoms. The photoinitiator containing asymmetric hexa-aryl diimidazole is obtained through a plurality of synthesis steps such as benzoin synthesis, benzyl synthesis, and the like. The alkoxy and fluorine or chlorine atoms with higher activity are introduced into the asymmetric hexa-aryl diimidazole to improve the solubility of the photoinitiator. In addition, the photoinitiator has good absorption of ultraviolet light and visible light, reconditions and improves the production and application environment of the photoresist product, and reduces the emission of pollutants.

Description

technical field [0001] The invention relates to a photoinitiator and a preparation method thereof, in particular to a mixed photoinitiator containing an asymmetric hexaarylbiimidazole and a preparation method thereof. Background technique [0002] UV curing technology has been widely used in photocuring coatings, photoresists, photocuring inks, microelectronics, adhesives, optical disk replication, paper glazing and other technologies. In the process of photocuring technology progress, photoinitiator systems Research and development has always occupied a very important position. Hexaarylbisimidazole HABI compounds have a special chemical structure, and can be photolyzed into triarylimidazole radicals under the action of ultraviolet light, and are very important photoinitiators in photoresists. The maximum absorption peak of HABI in the spectrum is 255-275nm. It is not sensitive to long-wave ultraviolet light and visible light, or the sensitivity is very low. After photocuri...

Claims

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Application Information

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IPC IPC(8): C08F2/50C07D233/56C09D7/12C09D11/00C09J11/06G03F7/004
Inventor 钱晓春吴士荣朱志浩丁正春赵贤
Owner CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS
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