A Wide Range Plasma Density Adjusting Device
A plasma and density adjustment technology, applied in the direction of plasma and electrical components, can solve the problems of inability to adjust the plasma density, limited adjustment range, difficult to master the plasma density, etc., to improve the use range, improve the ease of adjustment, The effect of improving the service life
Inactive Publication Date: 2011-12-21
BEIJING INST OF SPACECRAFT ENVIRONMENT ENG
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Problems solved by technology
[0002] During the use of traditional plasma sources, adjusting various parameters of the plasma source can change the output plasma density. etc. can adjust the plasma density generated by the plasma source, but because the influence of the adjustment of the plasma source parameters on the plasma density is generally non-linear, it is difficult to adjust to the required plasma density; in addition, by adjusting the plasma The source parameters are used to adjust the plasma density. The adjustment range is limited, and the plasma density cannot be adjusted in a wider range (up to the maximum plasma density achieved by the plasma source).
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[0019] Attached below Figure 1-4 The present invention is further described.
[0020] The wide-range plasma density adjustment device includes a porous disk 05, a circular vacuum chamber left plate 04, an annular sealing flange 06, a circular vacuum chamber right plate 07 and a dynamic sealing rotating device 02. The left plate 04 of the vacuum chamber and the right plate 07 of the vacuum chamber are placed on both sides of the sealing flange 06 in parallel, and the three are fixed by bolts to form an airtight vacuum container. There are annular grooves on both sides of the sealing flange 06, and the built-in O-shaped sealing ring helps to seal. The porous disc 05 is placed in the sealing flange 06, the porous disc 05 is coaxial with the left plate 04 of the vacuum chamber, the sealing flange 06, and the right plate 07 of the vacuum chamber, and is in the center with the moving part passing through the left plate 04 of the vacuum chamber. The shafts of the sealed rotating d...
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The invention realizes changing the output plasma density under the condition that the parameters of the plasma source remain unchanged by adding a set of adjustment devices at the outlet of the plasma source. The principle is: the plasma diffuses to reach the porous disk of the density adjustment device. The porous disk has holes corresponding to different densities, and only the plasma passing through the position facing the hole can pass through. By adjusting the aperture of the disc facing the plasma source, different apertures can be controlled at the output outlet of the plasma source, thereby controlling the plasma density. The invention changes the output plasma density without changing the parameters of the plasma source. The change trend can be pre-set by the user within the range not exceeding the maximum plasma density achieved by the plasma source, and the density change of 1 to 2 orders of magnitude can be performed rapidly.
Description
technical field [0001] The present invention relates to a wide-range plasma density adjustment device, in particular to a density adjustment device arranged at the outlet of a plasma source, which can change the output plasma density under the condition that the parameters of the plasma source remain unchanged. Background technique [0002] During the use of traditional plasma sources, adjusting various parameters of the plasma source can change the output plasma density. etc. can adjust the plasma density generated by the plasma source, but because the influence of the adjustment of the plasma source parameters on the plasma density is generally non-linear, it is difficult to adjust to the required plasma density; in addition, by adjusting the plasma The source parameters are used to adjust the plasma density, and the adjustment range is limited, and the plasma density cannot be adjusted in a wider range (up to the maximum plasma density achieved by the plasma source). Co...
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IPC IPC(8): H05H1/24H05H1/34
Inventor 刘业楠任兆杏冯伟泉徐焱林王志浩杨勇聂翔宇
Owner BEIJING INST OF SPACECRAFT ENVIRONMENT ENG