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Method for improving imaging properties of an optical system, and optical system

A technology of optical system and imaging characteristics, used in optics, microlithography exposure equipment, optomechanical equipment, etc., to achieve the effect of large deformation and reduced maintenance time

Inactive Publication Date: 2009-11-25
CARL ZEISS SMT GMBH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0016] Another disadvantage of thermal manipulators correcting for imaging aberrations arises from the fact that changes in the imaging properties of optical elements have to be calculated in a complex manner, taking into account the resulting temperature changes

Method used

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  • Method for improving imaging properties of an optical system, and optical system
  • Method for improving imaging properties of an optical system, and optical system
  • Method for improving imaging properties of an optical system, and optical system

Examples

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Embodiment Construction

[0083] figure 1 An optical system is shown, which is given the general reference 10 and which allows imaging of a pattern of a structure 20 or mask (reticle) onto a photosensitive substrate 22 .

[0084]An optical system 10 of this type can be used as a projection objective for fabricating finely patterned features in microlithography.

[0085] A light source 24 to which an illumination optics assembly 25 is assigned illuminates a structure 20 disposed in an object plane 26 of the optical system 10 . A light beam 28 is transmitted through a partial area of ​​the structure 20 and into the optical system 10 . The optical system 10 images the structure 20 in a reduced manner onto the photosensitive substrate 22 which is placed in the image plane 30 of the optical system 10 .

[0086] The optical system 10 has a plurality of optical elements, in the schematic illustration, four optical elements 42-48, which may be formed as lenses, mirrors, or parallel plane plates with various ...

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Abstract

A method for improving imaging properties of an optical system (10) and also an optical system (10) of this type having improved imaging properties are described. The optical system (10) has a plurality of optical elements. For at least partly correcting at least one imaging aberration, at least a first optical element (42) from the plurality of optical elements is positioned and / or deformed by means of mechanical force action (72) and by means of thermal action (76), or the at least first optical element (42) is positioned and / or deformed by means of mechanical force action (72) and at least a second optical element (46) from the plurality of optical elements is deformed by means of thermal action (78).

Description

technical field [0001] The present invention relates to a method for improving the imaging properties of an optical system. Furthermore, the invention relates to an optical system with improved imaging properties. Background technique [0002] Optical systems in the form of, for example, projection objectives are used in semiconductor lithography for making fine pattern features. In this description, specific reference is made to projection objectives of this type. [0003] This type of optical system has a plurality of optical elements, which can be formed, for example, as lenses, mirrors, or plane-parallel plates with various reflective / refractive properties. [0004] Projection objectives are used to image the structure or pattern of a mask (reticle) onto a photosensitive substrate. In this case, the structure placed in the object plane of the optical system is illuminated by the illumination source and its associated illumination optics. Light transmitted through the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70308G03F7/70891G03F7/70266G03F7/70191
Inventor 奥拉夫·康拉迪
Owner CARL ZEISS SMT GMBH
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