Automatic film coating device

Abstract

The invention discloses an automatic film coating device comprising a machine body, a support frame, a substrate, a rotation device and a turnover device; wherein, the rotation device comprises a first driving device and a first transmission shaft connected with the first driving device; the turnover device comprises a second driving device and a second transmission shaft connected with the second driving device; the first driving device and the second driving device are adjacently fixed on the top of the machine body, and the first transmission shaft and the second transmission shaft are mutually parallel; one end of the support frame is rotatablely connected to the machine body, and the substrate is rotatablely connected to the support frame; the first driving device drives the first transmission shaft so as to drive the support frame to rotate horizontally, and the second driving device drives the second transmission shaft so as to drive the substrate to rotate vertically. The automatic film coating device of the invention can ensure that when one surface of a base wafer to be coated on the substrate finishes coating films, the other surface can perform film coating after automatic turnover without lowering temperature and breaking vacuum.

Description

technical field [0001] The invention relates to a coating device, in particular to an automatic coating device. Background technique [0002] At present, the physical vapor deposition method (Physics Vapor Deposition, referred to as PVD) is the main method of optical thin film production. This method converts the film material from solid state to gaseous or ionic state material. The evaporation source travels through the space and reaches the glass surface, and the film material reaches the glass. Thin films are gradually formed after deposition on the surface (see "Current Status and Development of Vacuum Coating Technology", Wang Yinchuan, "Modern Instruments", No. 6, 2000, pages 1-4). Usually, in order to make the thin film have high purity, the coating process must be completed in a high vacuum environment. Vacuum coating is extended from this. The general method is to clean the substrate with an ultrasonic cleaning machine. After cleaning, the substrate is placed on th...

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Problems solved by technology

[0003] However, in the existing vacuum coating equipment, only one side of the substrate can be coated at a time. If you want to coat it on both sides, you need to open the coating machine to destroy its vacuum state; The temperature in the chamber is extremely high, so it needs to be cooled down and taken out, then turned over and put back into the vacuum chamber. At this time, it needs to be reheated and evacuated, which will increase the coating cycle and the number of times of vacuuming, and cannot maintain the vacuum chamber. The parameter consistency of the degree of vacuum will make the film characteristics of the double-sided coating layer of the substrate inconsistent

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