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Spinous process implants and associated methods

An implant and spinous process technology, applied in the field of spinous process implants, can solve problems such as outer layer or annulus cracks or cracks, outward protrusions, etc.

Inactive Publication Date: 2013-05-01
LANX INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Degradation may also result in ruptures or cracks in the outer layer or annulus of the disk
The disc may start to bulge outward

Method used

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  • Spinous process implants and associated methods
  • Spinous process implants and associated methods
  • Spinous process implants and associated methods

Examples

Experimental program
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Effect test

Embodiment Construction

[0036] Embodiments of spinous process implants according to the present invention include a spacer and an extension extending outwardly from the spacer. The spinous process implant may be configured for insertion between adjacent spinous processes of the cervical, thoracic, and / or lumbar spine. Multiple sizes of spacers are available to accommodate anatomical differences between patients and different angles of spacer correction. The spacer may include openings to facilitate tissue growth, eg, from spinous processes, to secure the spacer to the vertebral body. The spacer can be configured to facilitate tissue growth from the superior and inferior spinous processes, thereby facilitating fusion of adjacent spinous processes. The opening may be relatively large and / or communicate into the hollow interior of the spacer. The hollow interior may be configured to receive a bone growth promoting substance, eg, squeeze the promoting substance into the hollow interior. The openings m...

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Abstract

The present invention provides spinous process implant and associated methods. In one aspect of the invention the implant limits the maximum spacing between the spinous processes. In another aspect of the invention, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect of the invention, an implant includes a spacer and separate extensions engageable with the spacer. The spacer is provided in a variety of lengths and superior to inferior surface spacings. In another aspect of the invention, an implant includes a spacer and a cerclage element offset from the midline of the spacer in use so that the spacer defines a fulcrum and the cerclage element is operative to impart a moment to the vertebrae about the spacer. In another aspect of the invention, instrumentation for inserting the implant is provided. In other aspects of the invention, methods for treating spine disease are provided.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Provisional Application Serial No. 60 / 912,273, filed April 17, 2007, and US Provisional Application Serial No. 60 / 884,581, filed January 11, 2007. technical field [0003] The present invention relates to spinous process implants and related methods. Background technique [0004] The vertebrae of the human spine are arranged in a column, with one vertebra sitting on top of the next. Intervertebral discs sit between adjacent vertebrae and serve to transmit forces between adjacent vertebrae and provide a cushion between them. The intervertebral discs allow the spine to bend and twist. As we age, the discs begin to damage or degenerate, resulting in a decrease in the fluid within the discs and thus their flexibility. Likewise, the disc becomes thinner, moving the vertebrae closer together. Degradation may also cause ruptures or cracks in the outer layer or annulus of the disk. T...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61B17/70
CPCA61B17/842A61B2017/00477A61B17/7068A61B17/7061
Inventor 安德鲁·兰伯恩迈克尔·富尔顿杰夫·思拉曼
Owner LANX INC
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