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Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus

A brittle material substrate, laser scribing technology, used in fine working devices, laser welding equipment, glass cutting devices, etc., can solve problems such as asymmetry, position offset, thermal distribution asymmetry, etc.

Inactive Publication Date: 2012-10-03
MITSUBOSHI DIAMOND IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the irradiation area is different on the left and right sides of the planned scribing line S, and the heat distribution generated on the surface of the substrate A by laser irradiation becomes asymmetrical on the left and right sides of the planned scribing line S, and the same position as when the foreign matter exists asymmetrically occurs. offset problem
[0032] Furthermore, when the planned scribing line S is not parallel to the edge M1 of the substrate A and the distance from the planned scribing line S to the edge M1 varies, the heat generated by laser irradiation is distributed on the planned scribing line S. The left and right are still asymmetrical, resulting in the same problem
[0033] In addition, for substrates made of materials other than glass, the above-mentioned problems may also occur.

Method used

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  • Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus
  • Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus
  • Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus

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no. 1 approach )

[0081] Hereinafter, embodiments of the present invention will be described based on the drawings. figure 1 It is a schematic configuration diagram of a laser scribing device LS1 as one embodiment of the present invention. figure 2 to show figure 1 A diagram of the structure of the control system of the laser scribing device LS1. image 3 A diagram illustrating the structure of an optical holder incorporating an optical system for adjusting the beam spot.

[0082] First, based on figure 1 The overall structure of the laser scribing device LS1 will be described.

[0083] Along a pair of guide rails 3 and 4 arranged in parallel on the horizontal platform 1, there are figure 1 The sliding table 2 that reciprocates in the front and back direction of the paper (hereinafter referred to as the Y direction). Between the two guide rails 3, 4, a lead screw (スクリュネネジ) 5 is disposed along the Y direction, on which a pillar 6 fixed to the slide table 2 is screwed, and a motor (not ...

no. 2 approach )

[0117] Figure 9 It is a schematic configuration diagram of a laser scribing device LS2 according to another embodiment of the present invention. Figure 10 to show Figure 9 A diagram of the structure of the control system of the laser scribing device LS2. right with figure 1 , figure 2 The same structures are assigned the same symbols and descriptions of common parts are omitted.

[0118] The laser scribing device LS2 has the above-mentioned laser scribing device LS1 as a basic structure, and further includes a camera 61 that moves along the planned scribing line S with the planned scribing line S set on the substrate A as the center of the imaging area. Line S reflects the surface of substrate A. The camera 61 is supported by the arm 24 in a freely movable position. Arm 24 consists of Figure 10 The shown camera drive unit 63 controls. For the camera 61 , the most suitable camera 61 is selected from infrared cameras, optical cameras (visible light cameras), X-ray ...

no. 3 approach )

[0130] In the first to second embodiments, the irradiation area adjustment unit is installed on the side of the laser scribing device to make the heat distribution of the substrate A after laser irradiation centered on the planned scribing line to be left-right symmetrical, while in the third embodiment In the method, an irradiation area adjustment unit is installed on the side of the substrate A to adjust the heat distribution of the substrate A after laser irradiation to be left-right symmetrical across the line to be scribed.

[0131] Figure 12 It is a figure explaining the scribing method which attaches the irradiation area adjustment unit to the board|substrate A side of this invention, and performs scribing. In this example, a coating region C is formed in a region serving as a unit display substrate U of the mother substrate A (mother substrate).

[0132] In addition, the provisional coating 71 is formed in advance, and the distance d1 between the planned scribing lin...

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Abstract

Provided is a method for forming a scribe line excellent in linearity along a scribe-scheduled line. A laser beam irradiating mechanism is relatively moved such that irradiation area adjusting means (44b) is attached to the laser beam irradiating mechanism or a substrate. The irradiation area adjusting means (44b) makes the heat distribution along a scribe-scheduled line transversely symmetric, when the laser beam irradiating mechanism is moved relative to the region, in which the heat distribution on the two transverse sides of the scribe-scheduled line when the beam spot is scanned becomes asymmetric due to the difference in the substrate states near the two transverse sides of the scribe-scheduled line.

Description

technical field [0001] The present invention relates to a laser scribing method and a laser scribing device for irradiating a brittle material substrate with a laser beam and then cooling the substrate so as to generate vertical cracks to form a scribe line, and in particular to a brittle material substrate coated with a film such as a transparent conductive film A scribing method and a scribing device for a brittle material substrate in which a laser beam is irradiated near a coating film or an edge of a brittle material substrate to form a scribe line. [0002] Here, the brittle material substrate refers to glass substrates, ceramics made of sintered materials, single crystal silicon, semiconductor wafers, ceramic substrates, sapphire substrates, and the like. In addition, the brittle material substrate includes not only a single board composed of a single substrate, but also a bonded substrate formed by bonding substrates together. Background technique [0003] A laser s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B28D5/00B23K26/00C03B33/09B23K26/364
CPCB23K26/08B23K26/0656B23K26/0736B28D5/0011C03B33/027C03B33/091B23K2201/40B23K26/408B23K26/066B23K26/40B23K2101/40B23K2103/52C03B33/0222
Inventor 山本幸司在间则文五户统悟熊谷透井上修一
Owner MITSUBOSHI DIAMOND IND CO LTD