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General-purpose spatial double-positioning rotating mechanism

A rotating mechanism and dual positioning technology, applied in the field of mechanical motion, can solve problems such as affecting the rotation accuracy, and achieve the effect of high rotation accuracy

Inactive Publication Date: 2013-02-13
NAT INST OF METROLOGY CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] At present, there are many designs of spatial multi-dimensional rotating structures, but these designs are based on intuitive bow-shaped structures, and their shortcomings mainly include: (1) The rotating structure needs to support the moment of inertia of the load, which affects the rotating accuracy

Method used

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  • General-purpose spatial double-positioning rotating mechanism
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  • General-purpose spatial double-positioning rotating mechanism

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Embodiment Construction

[0034] The general space dual-positioning rotation mechanism of the present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0035] figure 2 It is a schematic diagram of the three-dimensional space structure of the universal space dual-positioning rotating mechanism of the present invention. As can be seen from the figure, the universal space dual-positioning rotating mechanism includes a large turntable 5, which is used as the base of the rotating mechanism, which carries other components of the rotating mechanism and can drive the carried object to rotate. Turntable motor 1; incident ray stage 6, located on the large turntable; small turntable 7, located on the incident ray stage 6, as a bearing device and can drive the object to be carried on it to rotate, a small turntable motor 2 is installed on its side ; The plane frame carrier 8 is located on the small turntable 7, on which the plane frame 10 is carried...

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Abstract

The invention relates to a general-purpose spatial double-positioning rotating mechanism, which comprises a big turntable as a mechanism base, and the big turntable bears other parts of the rotating mechanism and can drive a borne object to rotate; an incident ray bearer is arranged on the big turntable, and bears an incident ray emitter; a small turntable as a bearer is arranged on the incident ray bearer, and can drive a borne object on the small turntable to rotate; a plane holder bearer is arranged on the small turntable, and bears a plane holder, which can rotate around the shaft of the plane holder bearer; a plane carrier is mounted on the plane holder, and can rotate around the center of the plane holder in the plane holder; and a planer object is mounted on the plane carrier. The four rotating structures are independent from one another, and can rotate within corresponding planes or around shafts by 360 degrees; the four rotating structures are supported on the plane of the base to rotate, additional rotating inertia structures are not added, and high rotation precision is realized; and the rotating mechanism 'liberates' the incident ray generation mechanism and the reflected ray generation mechanism, so that the mechanisms can be fixed.

Description

technical field [0001] The invention belongs to the field of mechanical motion, and relates to a multi-dimensional rotation mechanism in space, and more particularly, to a universal rotation mechanism for realizing dual positioning in space, which can be used in scientific research and practical applications in all industries where accurate dual positioning rotation in space is required. . Background technique [0002] At present, there are many designs of spatial multi-dimensional rotating structures, but these designs are based on the intuitive arcuate structure. The main shortcomings are: (1) The rotating structure needs to support the moment of inertia of the load, which affects the rotation accuracy. (2) The rotating structure places the double-positioned positions in a multi-dimensional motion structure, so a large amount of motion will cause damage to the load in the double-positioned position, especially when the load is a precision instrument. [0003] figure 1 Th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N23/20
Inventor 刘子龙
Owner NAT INST OF METROLOGY CHINA