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Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events

A probabilistic, arc technology, applied in the direction of measuring electric power, measuring current/voltage, measuring electricity, etc., can solve problems such as workpiece or chamber component damage

Active Publication Date: 2013-11-20
MKS INSTR INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

If any arcing occurs between the plasma and the workpiece being fabricated, or between the plasma and any chamber component, damage to the workpiece or chamber components may occur

Method used

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  • Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events
  • Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events
  • Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events

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Embodiment Construction

[0039] The following description is merely exemplary in nature and is in no way intended to limit the disclosure, its application, or uses. For purposes of clarity, the same reference numbers will be used in the drawings to identify similar elements. As used herein, the term at least one of A, B, and C should be construed to refer to a logical (A or B or C) using a non-exclusive logical or. It should be understood that steps within a method may be executed in different order without altering the principles of the present disclosure.

[0040] As used herein, the term module refers to an application-specific integrated circuit (ASIC), an electronic circuit, a processor (shared, dedicated, or group) that executes one or more software or firmware programs, and memory, combinational logic, and / or provides all Other suitable components describing the function.

[0041] now refer to figure 1 , one of several embodiments of a radio frequency (RF) plasma generator system 10 is shown...

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Abstract

An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Description

[0001] Cross References to Related Applications [0002] This application is a continuation-in-part of US Patent Application No. 12 / 031,171, filed February 14, 2008, and a continuation-in-part of US Patent Application No. 12 / 125,867, filed July 18, 2008. The disclosures of the aforementioned applications are hereby incorporated by reference. technical field [0003] The present invention relates to arc detection in radio frequency (RF) plasma generation systems. Background technique [0004] The background description provided herein is for the purpose of generally presenting the context of the disclosure. The work of the inventors named herein is described in this Background section and aspects that may not be described as prior art at the time of filing are not admitted, expressly or by implication, to be prior art with respect to the present disclosure. [0005] Plasma chambers may be used to perform various processes such as chemical vapor deposition, sputter depositio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/24G01R29/00H01H9/30H01J23/00G16Z99/00
CPCG06F19/00G01R21/01G01R19/0061G01R31/00G01R31/12G16Z99/00H01J37/32935G01R31/1227G01R23/02G01R19/252G01R29/00H05H1/24
Inventor 戴维·J·库莫
Owner MKS INSTR INC