Method for manufacturing ohmic contact on SiC matrix for preventing transverse spreading of metal

An ohmic contact and substrate technology, applied in semiconductor devices and other directions, can solve the problems of deviation from design requirements, increase parasitic parameters, and reduce the performance of SiC devices or circuits, and achieve the effect of improving performance and reducing parasitic parameters.

Active Publication Date: 2011-11-16
THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the thermal expansion coefficients of the metal layer and the SiC substrate are different at high temperatures of 900°C to 1200°C, and the thermal expansion coefficient of the metal layer is relatively large, it will expand laterally during high-temperature annealing, which deviates from the design requirements and increases parasitic parameters, reducing the performance of SiC devices or circuits

Method used

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  • Method for manufacturing ohmic contact on SiC matrix for preventing transverse spreading of metal
  • Method for manufacturing ohmic contact on SiC matrix for preventing transverse spreading of metal
  • Method for manufacturing ohmic contact on SiC matrix for preventing transverse spreading of metal

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Embodiment Construction

[0020] The process flow of the present invention is as figure 2 Shown. The method for manufacturing an ohmic contact of the present invention is described below by taking an example of manufacturing an ohmic contact of a field effect transistor:

[0021] 1) Use dry etching method to etch the required SiC matrix 1, see image 3 .

[0022] 2) The groove 5 is etched by dry etching on the upper surface of the SiC substrate 1. The groove 5 is used to make Schottky contacts, see Figure 4 ; Delimit the area of ​​ohmic contact outside the groove on the SiC substrate. The dry etching is performed according to the existing process.

[0023] 3) Oxidation step: oxidize the upper surface of the SiC substrate and its adjacent sidewalls to form a thickness of 1000~ Oxide layer 2, see Figure 5 . The composition of the oxide layer is SiO 2 .

[0024] The conditions of the oxidation step are:

[0025] Oxidation temperature: 1200~1350℃;

[0026] Oxidation rate: ≥ / hour;

[0027] Oxidizing atmosphere...

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Abstract

The invention discloses a method for manufacturing ohmic contact on an SiC matrix for preventing transverse spreading of metal, which is characterized by consisting of the following steps of: dry-etching the SiC matrix, dividing a region for ohmic contact, depositing a metal layer in the region, and carrying out high-temperature annealing to form the ohmic contact, wherein before the step of depositing the metal layer, the following steps are added : (1) an oxidization step for oxidizing the SiC matrix to form an oxide layer with thickness of not less than 1000 angstroms; (2) and a step of removing the oxide layer on the region of the ohmic contact. By adopting the invention, the certain transverse spreading of the molten metal layer is effectively prevented in the high-temperature annealing process; a ohmic electrode is manufactured conveniently according to the design requirements; parasitical parameters are reduced and the performance of the SiC device or the circuit is improved.

Description

Technical field [0001] The invention belongs to the technical field of making electrodes on semiconductor materials, and in particular relates to a method for preventing lateral expansion of a metal layer when making ohmic contacts on a SiC device. Background technique [0002] SiC is a rapidly developing semiconductor material, known as the "third-generation semiconductor" after silicon and gallium arsenide, and it has broad prospects in the preparation of semiconductor devices. [0003] In order to effectively connect the SiC device to the outside, a contact must be made between the SiC device and the metal connection. There are two types of frequently used contacts: ohmic contacts and rectifying contacts. In an ideal ohmic contact, the current changes linearly with the applied voltage. In order to transmit as much current as possible from the SiC device to the entire circuit, the ratio of the ohmic contact resistance to the resistance of the entire device must be small, that i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/28
Inventor 霍玉柱潘宏菽商庆杰齐国虎
Owner THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
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