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Multi-gradation photomask and method of manufacturing the same, and pattern transfer method

A manufacturing method and photomask technology, which are applied in the field of multi-tone photomasks, can solve the problems of deterioration of etching precision of processing layers, a large amount of time for manufacturing qualification rate, etc., and achieve the effect of improving manufacturing qualification rate and production efficiency.

Active Publication Date: 2012-06-06
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, in the TFT manufacturing process, there are cases where the etching accuracy of the processed layer deteriorates, the manufacturing yield, etc. deteriorate, or it takes a lot of time to propose processing conditions

Method used

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  • Multi-gradation photomask and method of manufacturing the same, and pattern transfer method
  • Multi-gradation photomask and method of manufacturing the same, and pattern transfer method
  • Multi-gradation photomask and method of manufacturing the same, and pattern transfer method

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Experimental program
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Effect test

no. 1 Embodiment approach

[0032] Next, a first embodiment of the present invention will be described with reference to the drawings.

[0033] figure 1 (a) is a partial sectional view of the multi-color photomask 100 of this embodiment, figure 1 (b) is a partial cross-sectional view of the resist pattern 4 p formed on the transfer target body 1 through the multi-color photomask 100 . figure 2 It is a schematic diagram illustrating the manufacturing process flow of the multi-color photomask 100 of this embodiment. Figure 7 It is a flowchart of the manufacturing method of a TFT substrate including the pattern transfer process using the multi-color photomask 100 of this embodiment.

[0034] (1) Structure of multi-color photomask

[0035] figure 1 The multi-color photomask 100 shown in (a) is used for the thin-film transistor (TFT) of a liquid crystal display (LCD), a color filter, a plasma display panel (PDP), etc., for example. but, figure 1 , figure 2 The laminated structure of the photomask is...

no. 2 Embodiment approach

[0085] Next, a second embodiment of the present invention will be described with reference to the drawings.

[0086] image 3 (a) is a partial sectional view of the multi-color photomask 200 of this embodiment, image 3 (b) is a partial cross-sectional view of a resist pattern 4 p formed on the transfer target body 1 through the multi-color photomask 200 . Figure 4 It is a schematic diagram illustrating the flow of the manufacturing process of the multi-color photomask 200 of this embodiment.

[0087] (1) Structure of photomask

[0088] image 3 The multi-color light mask 200 shown in (a) has a transfer pattern including a light-shielding portion 221, a first semi-transmitting portion 222, a second semi-transmitting portion 223, and a light-transmitting portion 224. When the multi-color photomask 200 is used, the exposure light is blocked (the light transmittance is approximately 0%), and the first semi-transparent portion 222 reduces the transmittance of the exposure lig...

no. 3 Embodiment approach

[0113] Next, a third embodiment of the present invention will be described with reference to the drawings.

[0114] Figure 5 (a) is a partial sectional view of the multi-color photomask 300 of this embodiment, Figure 5 (b) is a partial cross-sectional view of a resist pattern formed on the transfer target body 1 through the multi-color photomask 300 . Figure 6 It is a schematic diagram illustrating the manufacturing process flow of the multi-color photomask of this embodiment.

[0115] (1) Structure of photomask

[0116] Figure 5 The multi-color light mask 300 shown in (a) has a transfer pattern including a light-shielding portion 321, a first semi-transmitting portion 322, a second semi-transmitting portion 323, and a light-transmitting portion 324. When the multi-color photomask 300 is used, the exposure light is blocked (the light transmittance is approximately 0%), and the first semi-transparent portion 322 reduces the transmittance of the exposure light to 20-50%,...

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Abstract

The present invention provides a multi-gradation photomask, a method of manufacturing the multi-gradation photomask, and a pattern transfer method, capable of accurately controlling the gradation shape of a resist pattern formed for a transfer body. the multi-gradation photomask is provided with a transfer pattern including a lightproof part, a light transmission part, a first semi-transmission part and a second semi-transmission part on a transparent substrate, wherein the permeation rate of the first semi-transmission part relative to exposure light is less than that of the second semi-transmission part, a phase difference of the exposure light permeating the first semi-transmission part and the exposure light permeating the second semi-transmission part is controlled so as to ensure that the light intensity formed by interference of the exposure light permeating the first semi-transmission part and the exposure light permeating the second semi-transmission part is more than that ofthe exposure light permeating the first semi-transmission part.

Description

technical field [0001] The present invention relates to a multi-color photomask used in the manufacture of flat panel displays (FPD: hereinafter referred to as FPD) such as liquid crystal display devices, a multi-color photomask manufacturing method, and a pattern transfer method. Background technique [0002] The TFT (Thin Film Transistor) substrate used in liquid crystal display devices uses a photomask in which a transfer pattern consisting of a light-shielding portion and a light-transmitting portion is formed on a transparent substrate, for example, through five to six photolithography processes. made. In recent years, in order to reduce the number of photolithography steps, a multi-color photomask in which a transfer pattern including a light-shielding portion, a semi-transmitting portion, and a light-transmitting portion is formed on a transparent substrate has been used. Furthermore, the present applicant has proposed the following scheme: if a multi-color light-emi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00G03F1/32G03F7/20G02F1/1368G03F1/28G03F1/54G03F1/58
CPCG03F1/54G03F1/58G03F7/2008H01L21/0274H01L21/0276
Inventor 山口昇
Owner HOYA CORP