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Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate

A technology of light irradiation device and exposure device, which is applied in the direction of photolithography process exposure device, pattern surface photolithography process, microlithography exposure equipment, etc. Problems with lights on and off

Active Publication Date: 2010-12-08
V TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, power consumption is wasted, and optical components such as ND filters are required
In Patent Document 2, a method of lighting a part of lamps for exposure is recorded, but the purpose is to operate under a certain illuminance, not to suppress power consumption, and it does not record how to light a plurality of lamps and turn off
[0010] In addition, in Patent Documents 1 and 2, when replacing lamps, it is necessary to replace the lamps one by one, and it takes a long time to replace the lamps, and the stop time (stop time) of the device is prolonged.
As a technology aimed at eliminating downtime, as shown in Patent Document 3, a structure that enables lamp replacement during exposure operation is disclosed. However, the time it takes for an operator to perform the replacement operation itself is long because the replacement is performed independently. The question has not changed

Method used

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  • Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate
  • Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate
  • Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate

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Experimental program
Comparison scheme
Effect test

no. 1 approach

[0113] Such as figure 1 with figure 2 As shown, the partitioned successive proximity exposure apparatus PE of the first embodiment has a mask stage 10 holding a mask M, a substrate stage 20 holding a glass substrate (material to be exposed) W, and an illumination optical system for irradiating pattern exposure light. System 70.

[0114] Furthermore, the glass substrate W (hereinafter, simply referred to as "substrate W") is placed opposite to the mask M, and the surface (the side facing the mask M) where the pattern drawn on the mask M should be photolithographically coated Sensitizer.

[0115] The mask table 10 has: a mask table base 11 with a rectangular opening 11a formed in the center; The mask holding frame 12 of the mask holding part; it is arranged on the upper surface of the mask table base 11, and the mask driving is used to move the mask holding frame 12 in the X-axis, Y-axis, and θ directions to adjust the position of the mask M Agency16.

[0116] The mask sta...

no. 2 approach

[0177] Next, regarding the proximity scanning exposure apparatus according to the second embodiment of the present invention, refer to Figure 20 ~ Figure 25 Be explained.

[0178] Proximity scanning exposure device 101 such as Figure 23 As shown, a substantially rectangular substrate W conveyed in a predetermined direction is irradiated with exposure light L through a plurality of masks M on which a pattern P is formed while approaching the mask M, and the pattern P is etched on the substrate W. That is, this exposure apparatus 101 employ|adopts the scanning exposure method which performs photolithography, moving the board|substrate W with respect to the several mask M. In addition, the size of the mask used in this embodiment is set to 350 mm x 250 mm, and the length of the X direction of the pattern P corresponds to the length of the X direction of an effective exposure area.

[0179] Such as Figure 20 with Figure 21 As shown, the proximity scanning exposure apparatu...

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PUM

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Abstract

The present invention provides a light irradiation apparatus for an exposure apparatus capable of restraining electric power consumption corresponding to necessary luminous intensity and capable of performing simple control to the light source part, its lighting control method, exposure apparatus and substrate. The optical control part 76 has a plurality of lighting mode groups with different numbers of illumined light source part 73, and each lighting mode group respectively has a plurality of lighting modes A1 to D1, A2 to D3, A3 to D3 lighted up by the light source part 73 in point symmetric mode. Furthermore, the optical control part 76 controls that a preset number of light source parts 73 are lighted up at point symmetry mode according to identical lighting mode, therefore all light source parts 73 are lighted up in point symmetry mode.

Description

technical field [0001] The present invention relates to a light irradiation device used in an exposure device, a lighting control method thereof, an exposure device and a substrate, and more particularly relates to a photomask that can be applied to a substrate of a large flat panel display such as a liquid crystal display and a plasma display. A light irradiation device for an exposure device for photolithography of a mask pattern, a lighting control method thereof, an exposure device, and a substrate. Background technique [0002] Conventionally, various exposure devices such as proximity exposure devices, scanning exposure devices, projection exposure devices, mirror projectors, and adhesive exposure devices have been proposed as devices for manufacturing panels such as color filters of flat panel display devices. . For example, in a sequential approach type exposure apparatus, a mask smaller than a substrate is held by a mask stage, and a substrate is held by a table, a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70558H01L21/0275
Inventor 永井新一郎轻石修作原田智纪
Owner V TECH CO LTD
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