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Mask and preparation method thereof

A technology of mask plate and graphics, which is applied in the field of mask plate and its preparation, can solve the problems of not being able to meet the requirements of light-blocking or light-transmitting sealant, increasing the production cost of TFT-LCD, etc.

Active Publication Date: 2014-08-06
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing patterning masks used in the preparation of array substrates cannot meet the requirements of light blocking or light transmission during the curing process of the sealant
Therefore, the prior art usually needs to make an additional UV mask, thereby increasing the production cost of TFT-LCD

Method used

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  • Mask and preparation method thereof
  • Mask and preparation method thereof

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Embodiment Construction

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0031] figure 1 Schematic diagram of the structure of the mask plate provided by the present invention; figure 2 for figure 1 A-A' cross-section of the shown reticle. like figure 1 and figure 2 As shown, the reticle of this embodiment includes a substrate 1, on which a first film pattern and a partially transparent film pattern are formed, the first film pattern is formed by a first film 2, and the partially transparent film pattern is formed by a partia...

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Abstract

The invention relates to a mask and a preparation method thereof. The mask comprises a substrate, wherein a first film graph and a partially light-transmitting film graph are formed on the substrate; the partially light-transmitting film graph is positioned above or below the first film graph; and regions except for the partially light-transmitting film graph are completely light-transmitting regions. The mask of the invention can be prepared based on the conventional composition mask. The mask of the invention can realize composition function of the conventional composition mask and can realize light-blocking and light-transmitting functions of the conventional ultraviolet (UV) mask. In the process of preparing a thin film transistor liquid crystal display (TFT-LCD) by using the mask of the invention, the multiplexing of the masks required by a composition process and a box-aligning process can be realized, so the production cost of the TFT-LCD is reduced.

Description

technical field [0001] The invention relates to display technology, in particular to a mask plate and a preparation method thereof. Background technique [0002] Thin Film Transistor Liquid Crystal Display (TFT-LCD for short) occupies a dominant position in the current flat panel display market due to its small size, low power consumption, and no radiation. The TFT-LCD mainly includes a color filter (ColorFilter, CF for short) substrate and an array (Array) substrate arranged in pairs, and a liquid crystal layer filled between the CF substrate and the array substrate. [0003] In the TFT-LCD manufacturing process, such as the array substrate manufacturing process, the patterning process is mainly performed on the thin film layer deposited on the substrate based on the mask plate. The reticle itself forms a preset pattern, and its main function is to copy the pattern formed by the reticle itself to the substrate in equal proportions through the exposure processing of the exp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/22
Inventor 郭建周伟峰明星陈永
Owner BOE TECH GRP CO LTD
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