Method for optimizing removing function of jet flow polishing material of workpiece to be polished

A technology for polishing materials and workpieces, applied in the field of jet polishing material removal function optimization, to achieve the effect of easy process, convenient operation and simple structure

Inactive Publication Date: 2012-11-21
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0013] The purpose of the present invention is to solve the technical problem of prior art jet polishing removal function optimization method, and propose a kind of optimization method of jet polishing material removal function of polishing workpiece for this reason

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  • Method for optimizing removing function of jet flow polishing material of workpiece to be polished
  • Method for optimizing removing function of jet flow polishing material of workpiece to be polished
  • Method for optimizing removing function of jet flow polishing material of workpiece to be polished

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Embodiment Construction

[0030] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0031] Such as figure 1 The material removal function optimization method of the present invention is shown, which is to realize the optimization method of the jet polishing material removal function of the polished workpiece by using the jet polishing equipment including the jet nozzle 1, the optical component workpiece 2 to be polished, the container 3 and the computing unit, etc. ,Such as Figure 1A The steps shown are as follows:

[0032] Step S1: Detect the initial surface shape of the workpiece 2 to be polished, and obtain the surface shape data before polishing;

[0033] Step S2: using a container 3 filled with polishing liquid, and placing the workpiece 2 to be polished in the polishing liquid container 3;

[...

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Abstract

The invention discloses a method for optimizing a removing function of a jet flow polishing material of a workpiece to be polished, which comprises the steps of: detecting surface shape data of a workpiece to be polished before polishing by using a jet flow polishing system; placing the workpiece to be polished in a container filled with a polishing solution; regulating the distance between an outlet of a nozzle and the surface of the workpiece to be polished to ensure that the outlet of the nozzle is immersed in the polishing solution; within a unit time, carrying out full-immersion jet polishing on the workpiece to be polished in a fixed point manner by using the nozzle to obtain removal distribution of a removing material for removing the workpiece to be polished; and detecting the removal distribution of the removing material for removing the workpiece to be polished by the nozzle in a fixed point polishing region within a unit time by using an interferometer to generate surface shape data of the workpiece to be polished after the removing material is polished, and subtracting the surface shape data of the workpiece to be polished after the removing material is polished from the surface shape data of the workpiece to be polished before polishing by using a calculating unit to obtain optimization distribution for displaying the removing function of the material.

Description

technical field [0001] The invention relates to a novel jet polishing material removal function optimization method, which belongs to the technical field of photoetching objective lens optical manufacturing. Background technique [0002] The key equipment for microelectronics is an important support for microelectronics technology. The lithography objective lens is the key core part of the distributed and repeated projection lithography of special equipment for microelectronics. direct relation. The quality requirements of lithography objective optical components are an order of magnitude higher than other high-precision optical components. For example, the radius of curvature is less than or equal to 1 μm, the surface error is less than or equal to λ / 20~λ / 100, and the rms root mean square value is less than or equal to It is equal to λ / 100~λ / 300, etc., and puts forward extremely strict requirements on the accuracy of the outer diameter, center thickness, radius of curvatur...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24C1/08
Inventor 施春燕袁家虎伍凡万勇建范斌雷柏平
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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