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Ultraviolet reflector with coolant gas holes and method

A reflector, coolant technology, applied in the field of ultraviolet treatment, can solve the problems of shortening the life of the ultraviolet source, increasing the ultraviolet radiation, increasing the chamber heat, etc.

Inactive Publication Date: 2013-09-11
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, increasing the UV radiation by using a high power source or other means also increases the heat generated in the chamber
This excess heat can negatively impact the features being processed on the substrate and can also shorten the life of the UV source itself

Method used

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  • Ultraviolet reflector with coolant gas holes and method
  • Ultraviolet reflector with coolant gas holes and method
  • Ultraviolet reflector with coolant gas holes and method

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Embodiment Construction

[0021] figure 1 An embodiment of an ultraviolet (UV) lamp module 20 is shown that is capable of generating ultraviolet radiation to treat substrates 38 such as semiconductor wafers, displays, and solar panels. The UV lamp module 20 includes a UV lamp 22 that emits ultraviolet radiation. UV lamp 22 may comprise any UV source such as a mercury microwave arc lamp, a pulsed xenon flash lamp, or a high efficiency UV lamp emitting diode array. In one version, the UV lamp 22 is a sealed plasma bulb filled with a gas such as xenon (Xe) or mercury (Hg), and the bulb is energized by an external power source 23, such as a microwave generator, comprising a magnetic The electric tube and the transformer that excite the magnetron filament. In another embodiment, the UV lamp 22 may include a filament powered by a power source 23 (shown schematically), which may supply direct current to the filament. The UV lamp 22 may also be powered by a power source 23 comprising a radio frequency (RF) ...

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PUM

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Abstract

A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.

Description

technical field [0001] Embodiments of the apparatus and methods of the present invention generally relate to ultraviolet treatment of substrates. Background technique [0002] In the manufacture of integrated circuits, displays, and solar panels, layers of dielectric, semiconducting, and conducting materials are formed on substrates such as semiconductor wafers, glass sheets, and metal sheets. These layers are then processed to form features such as electrical interconnects, dielectric layers, gates and electrodes. In other processes, ultraviolet radiation may be used to treat layers or features formed on a substrate. For example, ultraviolet radiation can be used in rapid thermal processing (RTP) to rapidly heat a layer formed on a substrate. Ultraviolet radiation can also be used to promote coacervation and polymerization of the polymeric layer. Ultraviolet radiation can also be used to produce a compressed film layer. Ultraviolet radiation can also be used to activate...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/324H01L21/205
CPCB82Y10/00G21K2201/064G21K1/062G21K2201/065G21K2201/067H01L21/324H01L21/205
Inventor Y-H·杨T·A·恩古耶S·巴录佳A·卡祖巴J·C·罗查T·诺瓦克D·W·何
Owner APPLIED MATERIALS INC