Contact exposure method and contact exposure apparatus

Abstract

The invention provides a contact exposure method and a contact exposure apparatus, which aim to eliminate the dislocation phenomenon even after repeated aligning operations during the aligning process of a contact exposure mask and a workpiece. In one embodiment, a mask (M) is in contact with a workpiece (W) and the positions of a mask alignment mark (MAM) and a workpiece alignment mark (WAM) are detected so as to obtain a first calibration quantity. Then the mask (M) and the workpiece (W) are separated from each other. According to the first calibration quantity, the mask (M) and the workpiece (W) are aligned with each other and are in contact with each other. The positions of a mask alignment mark (MAM) and a workpiece alignment mark (WAM) are detected so as to obtain a second calibration quantity. When the first calibration quantity and the second calibration quantity are consistent within a predetermined range, the second calibration quantity is stored as an image displacement. Then the mask (M) and the workpiece (W) are separated from each other again and the calibration quantity is obtained through the second calibration quantity plus the image displacement. Therefore, the mask (M) and the workpiece (W) are aligned with each other.

Description

technical field [0001] The invention relates to a contact exposure method and a device for transferring a pattern formed on the mask to a workpiece by making the mask closely contact with the workpiece, in particular to a method and device for aligning the mask and the workpiece during contact exposure. Background technique [0002] In the manufacture of various electrical components that require micro-processing, such as semiconductor devices, liquid crystal substrates, and micromachines, the workpiece is irradiated with light through a patterned mask in order to form various electronic components on the workpiece. The process of exposing a mask pattern on a workpiece. Among the exposure methods described above, there is contact exposure in which a mask is brought into close contact with a workpiece to transfer a mask pattern onto the workpiece. [0003] Figure 6 It is a figure which shows the example of a structure of a contact exposure apparatus, This figure is a cross-...

AI Technical Summary

Problems solved by technology

[0037] As mentioned above, conventionally, when the mask and the workpiece are aligned, even if the alignment is repeated, the misalignment cannot be eliminated and the calibration does not converge.

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