Variable wavelength interference filter, optical module, and photometric analyzer
An interference filter and wavelength technology, applied in measuring devices, color measuring devices, instruments, etc., can solve the problems of lower measurement accuracy and lower S/N ratio, and achieve deflection suppression, high transmittance, and improved resolution Effect
Active Publication Date: 2012-08-22
SEIKO EPSON CORP
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Problems solved by technology
Therefore, especially on the short-wavelength side, it is necessary to greatly amplify the output of the photoreceiver with an amplifier, resulting in a decrease in the S / N ratio and a decrease in measurement accuracy.
Method used
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Effect test
Embodiment 1
[0124] Embodiment 1 is to fix the TiO mirror 54 and the movable mirror 55 2 The film thickness of the film 57 is an example of 0.2Q. Specifically, the TiO 2 The film thickness T of the film 57 was set to 11 nm, and the film thickness S of the Ag alloy film (AgSmCu alloy film) 58 was set to 44 nm to manufacture an etalon.
Embodiment 2
[0126] Embodiment 2 is to fix the TiO mirror 54 and the movable mirror 55 2 The film thickness of the film 57 is an example of 1.6Q. Specifically, the TiO 2 The film thickness T of the film 57 was set to 90 nm, and the film thickness S of the Ag alloy film (AgSmCu alloy film) 58 was set to 37 nm to manufacture an etalon.
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Abstract
The present invention relates to a VARIABLE WAVELENGTH interference filter, an optical module and a photometric analyzer. An etalon as a tunable interference filter includes a first substrate, a second substrate, a fixed mirror, a movable mirror, and an electrostatic actuator. The respective mirrors are formed by stacking one layer of a TiO2 film and one layer of an alloy film. A film thickness dimension of the TiO2 film and a film thickness dimension of the Ag alloy film are set to film thicknesses such that reflectance of a reference wavelength may be target reflectance and reflectance of a set wavelength may be lower than that of the case where the reflection film is formed only by the metal film.
Description
technical field [0001] The present invention relates to a variable wavelength interference filter, an optical module including the variable wavelength interference filter, and an optical analysis device including the optical module. Background technique [0002] Conventionally, wavelength-variable interference filters (optical filters) in which mirrors (a pair of mirrors) as reflection films are respectively arranged to face each other with gaps therebetween on the surfaces of a pair of substrates facing each other have been known (for example, Refer to Patent Document 1). [0003] In the variable wavelength interference filter of this patent document 1, incident light is caused to interfere multiple times between a pair of mirrors, and light of a predetermined wavelength mutually strengthened by the multiple interference is transmitted. At this time, by changing the size of the gap between the reflectors, the wavelength of the transmitted light is changed. [0004] The va...
Claims
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IPC IPC(8): G02B26/00G01J3/02
CPCG01J3/26G01J3/51G02B26/001
Inventor 舟本达昭漆谷多二男
Owner SEIKO EPSON CORP