Magnification regulating method of projection optical system

A projection optical system and magnification adjustment technology, applied in optics, optical components, instruments, etc., can solve the problems of large overall size, inability to correct and adjust the projection magnification, and achieve reduced processing, good bi-telecentric projection optical characteristics, good The effect of optical imaging quality

Active Publication Date: 2012-08-22
ZHANGJIAGANG ZHONGHE AUTOMATION TECH
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  • Abstract
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Problems solved by technology

[0003] However, in the prior art, such as U.S. Patent No. 6,879,383 (announcement date: April 12, 2005), the refractive reflection structure is adopted, the overall size is large, and the requirements for optical glass materials are very strict. The processing of large-diameter concave mirrors , the detection technical requirements are also very strict, and it is impossible to correct and adjust the projection magnification

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  • Magnification regulating method of projection optical system
  • Magnification regulating method of projection optical system
  • Magnification regulating method of projection optical system

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Embodiment Construction

[0029] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0030] An embodiment of the present invention provides a projection optical system. The projection optical system is a symmetrical structure, that is, it includes a front group, an aperture stop, and a rear group in sequence from one side of the object plane, and the lens components of the front group and the rear group The optical structure is completely symmetrical with the aperture stop as a symmetrical plane (surface curvature radii, intervals are symmetrically equal, and optical materials are symmetrically consistent), and the magnification is -1. The combined rear focus of the front group coincides with the combined front focus of the rear group, and coincides ...

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Abstract

The invention provides a magnification regulating method of a projection optical system. The method comprises the following steps: firstly, providing a projection optical system, wherein the projection optical system comprises a front group, an aperture diaphragm and a rear group along the optical axis direction; the front group comprises a first glass group, a second glass group and a third glass group, wherein the first glass group and the third glass group have positive refractive powers, and the second glass group has negative refractive power; the rear group comprises a fourth glass group, a fifth glass group and a sixth glass group, wherein the fourth glass group and the sixth glass group have positive refractive power, and the firth glass group has negative refractive power; the front group and the rear group are in symmetry about the aperture diaphragm, and meanwhile, a group of lenses in symmetry in the third glass group and the fourth glass group are moved, and the projection magnification of the optical system can be regulated conveniently and effectively.

Description

technical field [0001] The invention relates to a method for adjusting the magnification of a projection optical system, in particular to a method for adjusting the magnification of a symmetrical double-telecentric projection optical system. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system is gradually improved, and the projection optical system can already be applied to various fields such as circuit manufacturing. In the actual production process of many circuit substrates, the substrates manufactured by different equipment will have slight differences in graphic size and magnification. At the same time, in various physical and chemical processing processes, the substrate will slightly expand or shrink. It will also lead to changes in the graphic size of the substrate, and the graphic size changes of different substrates are not the same, so in the manufacturing process of many substra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/18G02B13/22G02B13/00
Inventor 刘鹏
Owner ZHANGJIAGANG ZHONGHE AUTOMATION TECH
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