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Coloring photosensitive resin composition

A technology of photosensitive resin and composition, which is applied in the direction of optics, photomechanical equipment, and photolithographic process exposure devices, etc., which can solve problems such as peeling and foreign matter on the peeling sheet, and achieve the effect of inhibiting peeling and reducing foreign matter on the pattern

Active Publication Date: 2012-12-12
SUMITOMO CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the conventionally proposed colored photosensitive resin composition, part of the unexposed portion of the composition layer formed of the colored photosensitive resin composition peels off during development, and the peeled piece may become a foreign object on the pattern.

Method used

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  • Coloring photosensitive resin composition
  • Coloring photosensitive resin composition
  • Coloring photosensitive resin composition

Examples

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Effect test

Embodiment

[0267] Next, examples will be given to describe the present invention more specifically. Unless otherwise specified, "%" and "part" in an example are mass % and a mass part.

Synthetic example 1

[0269] Put 15 parts of the mixture of the compound shown in formula (A0-1) and the compound shown in formula (A0-2) (manufactured by Zhonggai Chemicals), 150 parts of chloroform and N, N-dimethyl in a flask equipped with a cooling tube and a stirring device 8.9 parts of methyl formamide were kept below 20°C under stirring, while 10.9 parts of thionyl chloride were added dropwise. After completion of the dropwise addition, it was heated to 50°C, maintained at the same temperature for 5 hours to allow a reaction, and then cooled to 20°C. While maintaining the cooled reaction solution at 20° C. or lower while stirring, a mixed solution of 12.5 parts of 2-ethylhexylamine and 22.1 parts of triethylamine was added dropwise. Thereafter, it was stirred at the same temperature for 5 hours to make it react. Next, after the obtained reaction mixture was subjected to solvent distillation using a rotary evaporator, a small amount of methanol was added and vigorously stirred. This mixture...

Synthetic example 2

[0273] Into a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, nitrogen gas was flowed at 0.02 L / min to obtain a nitrogen atmosphere, 184 parts by mass of ethyl lactate were charged, and heated to 70° C. while stirring. Next, 167 parts by mass of methacrylic acid and 3,4-epoxytricyclo[5.2.1.0 2.6 ] Decyl acrylate (mix the compound represented by the following formula (I-1) and the compound represented by formula (II-1) at a molar ratio of 50:50.) 284 parts by mass were dissolved in 140 parts by mass of ethyl lactate to prepare The solution was dropped into a flask kept at 70° C. using a dropping funnel over a period of 4 hours. On the other hand, 30 parts by mass of the polymerization initiator 2,2'-azobis(2,4-dimethylvaleronitrile) dissolved in ethyl lactate was dropped into the flask over 4 hours using another dropping funnel. A solution of 225 parts by mass of ester. After the dropwise addition of the solution of the polymerization ...

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Abstract

The present invention provides a coloring photosensitive resin composition, which includes a dye (A), a copolymer (B1), resin (B2), polymerized compound (C) and a polymerization initiator (D). The copolymer (B1) includes: a structural unit selected from the group consisting of at least one of unsaturated carboxylic acids and carboxylic acid anhydrides, a cyclic ether structure with the carbon number of 2-4, and a single structure unit of olefinic unsaturated bonds, wherein the side chains have no carbon-carbon unsaturated double bonds. The resin has side chains with carbon-carbon unsaturated double bonds and the weight-average molecular weight of the resin is above 10000 and below 100000. The weight-average molecular weight of the polymerized compound is below 3000. According to the present invention, the stripping of one part of an unexposed part on the composition layer formed by the coloring photosensitive resin composition during developing can be restrained, and the foreign matter on the pattern can be reduced.

Description

technical field [0001] The present invention relates to a colored photosensitive resin composition. Background technique [0002] The colored photosensitive resin composition is used to manufacture color filters used in display devices such as liquid crystal display panels, electroluminescence panels, and plasma display panels. As such a colored photosensitive resin composition, it is known that the resin contains only methacrylic acid and 3,4-epoxytricyclic [5.2.1.0 2.6 ] A composition of a copolymer of decyl acrylate (JP2010-211198-A). [0003] In order to form a pattern using a colored photosensitive resin composition, so-called photolithography is used in which a colored photosensitive resin composition is applied on a substrate to form a composition layer, and the composition layer is exposed through a photomask, developed, and a pattern is obtained. Law. However, in the conventionally proposed colored photosensitive resin composition, part of the unexposed portion o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027
CPCG03F7/004G03F7/0045G03F7/0047G03F7/027G03F7/028G03F7/20G03F7/202
Inventor 桐生泰行
Owner SUMITOMO CHEM CO LTD
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