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Floating body cell structures, devices including same, and methods for forming same

A technology of floating body and unit structure, which is applied in the direction of transistors, electrical components, semiconductor devices, etc., and can solve the problems of charge reduction and unit susceptibility to noise

Active Publication Date: 2012-12-12
MICRON TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as the thickness of the SOI substrate decreases, the amount of charge accumulated in the floating body decreases and the cell can be more susceptible to noise during operation

Method used

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  • Floating body cell structures, devices including same, and methods for forming same
  • Floating body cell structures, devices including same, and methods for forming same
  • Floating body cell structures, devices including same, and methods for forming same

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Embodiment Construction

[0014] The present invention discloses a multi-gate floating body cell structure, a device including the structure and a method for forming the structure. Such structures include, for example, at least one floating body cell disposed on the back gate and another gate associated with the at least one floating body cell. The other gate may be disposed within the at least one floating body or on a sidewall thereof. The structures and devices can be used in numerous semiconductor devices, such as dynamic random access memory (DRAM), zero capacitor random access memory (Z-RAM), and embedded dynamic random access memory (eDRAM). The structures and devices can be further used in systems such as central processing units (CPUs), system-on-chips (SOCs), sensors, imagers, microelectromechanical systems (MEMS), and nanoelectromechanical systems (NEMS). Methods of forming such structures include forming a base comprising a semiconducting material, a dielectric material, a gate material, a...

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PUM

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Abstract

Floating body cell structures including an array of floating body cells disposed on a back gate and source regions and drain regions of the floating body cells spaced apart from the back gate. The floating body cells may each include a volume of semiconductive material having a channel region extending between pillars, which may be separated by a void, such as a U-shaped trench. The floating body cells of the array may be electrically coupled to another gate, which may be disposed on sidewalls of the volume of semiconductive material or within the void therein. Methods of forming the floating body cell devices are also disclosed.

Description

[0001] Related Application Cross Reference [0002] This application is related to Serial No. 12 / XXX,XXX and entitled "Semiconductor-on-insulator metal structures, methods of forming such structures, and semiconductor devices incorporating such structures" (SEMICONDUCTOR-METAL-ON- INSULATOR STRUCTURES, METHODS OF FORMING SUCH STRUCTURES, AND SEMICONDUCTOR DEVICES INCLUDING SUCH STRUCTURES)” (Docket No. 2269-9742US); filed on the same date with serial numbers 12 / XXX,XXX and Titled "SEMICONDUCTOR DEVICES INCLUDING A DIODE STRUCTURE OVER A CONDUCTIVE STRAP, AND METHODS OF FORMING SUCH SEMICONDUCTOR DEVICES" (Docket No. 2269-9803US) co-pending U.S. patent application; filed on the same date as it, serial number 12 / XXX,XXX, and entitled "Thyristor-Based Memory Cells, Devices and Systems Including The Same, and Methods of Forming The Same (THYRISTOR- BASED MEMORY CELLS, DEVICES AND SYSTEMS INCLUDING THE SAME AND METHODS FOR FORMING THE SAME)" (Docket No. 2269-9804US); and serial num...

Claims

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Application Information

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IPC IPC(8): H01L27/108H01L21/8242
CPCH01L21/845H01L27/10802H01L27/1211H01L29/7841H01L27/10879H01L27/10826H01L29/4236H10B12/20H10B12/36H10B12/056H10B99/00H10B12/00
Inventor 山·D·唐約翰·K·查胡瑞沃纳·云林
Owner MICRON TECH INC
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