Device and method for continuous recovery treatment of chlorosilane residual liquid

A chlorosilane residual liquid, recovery and treatment technology, applied in the direction of halogenated silanes, halogenated silicon compounds, etc., can solve the problems of waste, difficult operation and many impurities, and achieve the effect of increasing yield and maximizing resource utilization.

Inactive Publication Date: 2013-05-22
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] Obviously, compared with the reasonable recovery of various components in the raffinate, the hydrolysis of the raffinate will cause huge waste, especially with the continuous expansion of polysilicon production, the raffinate that has not been reasonably recovered will increase exponentially. If the raffinate can be effectively recovered The high value-added components in the liquid, especially hexachlorodisilane, will surely enable enterprises to remain invincible in today's fierce polysilicon market competition
However, due to the many impurities in the chlorosilan

Method used

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  • Device and method for continuous recovery treatment of chlorosilane residual liquid
  • Device and method for continuous recovery treatment of chlorosilane residual liquid
  • Device and method for continuous recovery treatment of chlorosilane residual liquid

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Embodiment Construction

[0034] Combine below figure 1 Further details on the continuous scheme

[0035]A continuous chlorosilane residue recovery treatment device: including a filter (1), an initial distillation tower (2), a hexachlorodisilane light removal tower (3), a hexachlorodisilane weight removal tower (4), a tetrachloride Silicon dehydrogenation tower (5), silicon tetrachloride weight removal tower (6), filter residue storage tank (7), trichlorosilane storage tank (8), silicon tetrachloride storage tank (9), organochlorosilane storage tank (10), hexachlorodisilane storage tank (11), and high-boiling silicone oil storage tank (8); it is characterized in that a chlorosilane raffinate (13) feed inlet is provided on the filter (1), and a The filtrate outlet pipeline (14) is connected to the primary distillation tower (2), and the bottom is provided with a filter residue unloading pipeline (15) connected to the filter residue storage tank (7); the bottom of the primary distillation tower (2) is p...

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Abstract

The invention relates to a device and a method for continuous recovery treatment of chlorosilane residual liquid, and particularly relates to a method and a device for recovering hexachlonxlisilane with extremely high value. According to the method, a filter, a primary tower, a hexachlonxlisilane light-component removal column, a hexachlonxlisilane heavy-component removal column, a silicon tetrachloride light-component removal column and a silicon tetrachloride heavy-component removal column are mainly included. The device and the method are especially applicable to treatment of dirt residual liquids such as cold hydrogenation slurry, distillation residues and distillation residues of synthesis procedures during production of polycrystalline silicon as well as treatment of residual liquids such as distillation residues of reduction procedures, distillation residues of thermal hydrogenation procedures or the mixture of both; and based on the device and the method, organic chlorosilane difficultly separating from silicon tetrachloride and titanium tetrachloride difficultly separating from hexachlonxlisilane can be removed, and hexachlonxlisilane with the purity of 99.7 percent can be recovered according to the method.

Description

technical field [0001] The invention relates to a continuous chlorosilane raffinate recovery treatment device and method; in particular, it relates to a recovery method and a device for the recovery of high-boiler hexachlorodisilane (also known as hexachlorodisilane, perchlorodisilane) in chlorosilane. Background technique [0002] Polysilicon is the main raw material required by the electronics industry and the photovoltaic industry, and is a strategic material necessary for the development of my country's electronic information industry and solar photovoltaic industry. [0003] In the production process of polysilicon, a certain amount of raffinate will inevitably be produced along with the tail gas of rectification and purification of chlorosilane synthesis reaction, reduction reaction and cold (hot) hydrogenation reaction. This part of raffinate is useless for the production of polysilicon. In addition, due to the high solid content in this part of the raffinate, which c...

Claims

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Application Information

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IPC IPC(8): C01B33/107
Inventor 黄国强杨劲王国锋陈锦溢
Owner TIANJIN UNIV
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