Unlock instant, AI-driven research and patent intelligence for your innovation.

Mask pre-alignment system and pre-alignment method based on light source modulation

A technology of light source modulation and pre-alignment, which is applied in optics, microlithography exposure equipment, photoplate making process of pattern surface, etc., can solve problems such as high cost, and achieve the effect of reducing development cost and number of components

Active Publication Date: 2015-09-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This solution is feasible but has the problem of high cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask pre-alignment system and pre-alignment method based on light source modulation
  • Mask pre-alignment system and pre-alignment method based on light source modulation
  • Mask pre-alignment system and pre-alignment method based on light source modulation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] A mask pre-alignment device according to a specific embodiment of the present invention will be described in detail below with reference to the accompanying drawings. However, the present invention should be understood as not limited to such embodiments described below, and the technical idea of ​​the present invention can be implemented in combination with other known technologies or other technologies having the same functions as those known technologies.

[0028] In the following description, in order to clearly show the structure and working method of the present invention, many directional words will be used to describe, but "front", "rear", "left", "right", "outer", "inner" should be used Words such as ", "outward", "inward", "upper" and "lower" are to be understood as convenient terms, and should not be understood as restrictive terms. In addition, the term "X direction" used in the following description mainly refers to the direction parallel to the horizontal d...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a light-source-modulation-based mask pre-aligning system. The pre-aligning system comprises a light source unit used for providing pre-aligning beams for the system; at least one light-source internal modulation unit used for modulating the aligning beams; a mask plate and marks on the mask plate; a four-quadrant sensor unit used for receiving optical intensity signals after the marks are irradiated by the modulated aligning beams; a signal collecting, conditioning and demodulating unit used for collecting the optical intensity signals; and a mask moving and controlling system used for adjusting the position of the mask plate according to the optical intensity signals. The invention also discloses a light-source-modulation-based mask pre-aligning method.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a mask pre-alignment system and pre-alignment method based on light source modulation. Background technique [0002] The traditional mask alignment technology is based on the symmetry of the four-quadrant sensor, using LED light source (or laser light source) to irradiate the mask mark, and the four-quadrant sensor under the mark receives the light transmitted from the mask alignment mark The energy level is used to judge the position of the mask plate relative to the center of the four quadrants, and the position of the mask plate is adjusted according to the judgment to achieve the purpose of mask alignment. However, traditional mask alignment methods can only achieve point-to-point alignment. [0003] In order to solve the defect that the traditional mask alignment method can only achieve point-to-point alignment, a mask transmission four-quadrant ali...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 唐文力王海江王丽
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD