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Selective fixed-point transfer method for graphene

A transfer method and graphene technology, applied in the field of materials, can solve problems such as affecting the processing of graphene devices, and achieve the effect of controllable coverage

Active Publication Date: 2015-02-04
NANKAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because there are often a large number of graphite fragments around graphene prepared by mechanical exfoliation, it will greatly affect the measurement of graphene properties and the processing of devices.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Embodiment 1 SiO 2 Selective site transfer of mechanically exfoliated graphene on / Si substrate to another SiO 2 / Si on-chip, including the following steps:

[0022] (1) Using the method of mechanical exfoliation on Si / SiO 2 Prepare single-layer graphene on the substrate, and use a microscope to find the target graphene, substrate SiO 2 The layer thickness is 285nm;

[0023] (2) Spin-coat a layer of positive photoresist on the sample, the rotating speed is 2000rpm, and the time is 30s. The photoresist is selected from the AR-P 3510T type of AllResist Company;

[0024] (3) The microscope focuses the 800nm ​​femtosecond laser, and uses two-photon exposure to expose the area containing the target graphene, the objective lens is 100X, the femtosecond laser power is 10mW, and the scanning speed is 5μm / s;

[0025] (4) developing the sample after exposure, the target graphene region is exposed after developing, and the developing solution is selected from the AR 300-35 type...

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PUM

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Abstract

The invention provides a selective fixed-point transfer method for graphene. The photoresist exposure and PMMA transfer methods are combined, and a microscipe and a micro-operation platform are utilized for micro-operation control of transfer, so that the required graphene part can be selectively transferred from an integral structure to an assigned position of a target base. The method comprises the following steps: A, spin coating of photoresist and exposure and development of a selected area; B, secondary exposure of the integral photoresist; C, spin coating of a PMMA film; D, separation of a PMMA layer from an original base through soaking in a developer; E, transfer of the PMMA layer to which the target graphene is attached to a new base; F, adjustment of the graphene to a specific position; G, removal of PMMA to complete transfer. The selective fixed-point transfer method for graphene can efficiently transfer the selected graphene or graphene microstructure to the assigned position of the target base, and is particularly suitable for selection and transfer of graphene through mechanical cleavage.

Description

technical field [0001] The invention relates to a graphene transfer method, in particular to a transfer method for selectively transferring a required graphene part from an overall structure to a designated position of a target substrate, and belongs to the field of material technology. Background technique [0002] Graphene has unique electronic and physical properties, and has important application prospects in the fields of molecular electronics, micro-nano devices, composite materials, field emission materials, sensors, batteries and hydrogen storage materials. At present, there are three main preparation methods: (1) mechanical exfoliation method, which can obtain high-quality single-layer or multi-layer graphene, which is mainly used to study basic condensed matter physics problems or high-performance graphene micro-nano devices; (2) ) chemical vapor deposition method, which can prepare large-scale graphene samples, but the quality is worse than that of mechanically ex...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B31/04C01B32/194
Inventor 刘智波陈旭东田建国
Owner NANKAI UNIV
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