A real time monitoring apparatus and a method

A technology for real-time monitoring and adjustment of controllers, which is applied in the direction of discharge tubes, semiconductor/solid-state device testing/measurement, electrical components, etc., can solve the problems of inability to monitor ion implantation dose accuracy, dose controller stability, etc. in real time, and achieve human The effect of computer information exchange

Active Publication Date: 2014-03-12
FOUNDER MICROELECTRONICS INT
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Problems solved by technology

[0008] The embodiment of the present application provides a real-time monitoring device and method to solve the technical problem that the existing technology cannot perform real-time monitoring on the ion implantation dose accuracy and the stability of the dose controller

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  • A real time monitoring apparatus and a method
  • A real time monitoring apparatus and a method
  • A real time monitoring apparatus and a method

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Embodiment Construction

[0061] The embodiments of the present application provide a real-time monitoring device and method to solve the technical problem that the existing technology cannot monitor the accuracy of the ion implantation dose and the stability of the dose controller in the production process of the ion implantation equipment in real time.

[0062] The technical solution in the embodiment of the present application is to solve the above problems, and the general idea is as follows:

[0063] A real-time monitoring device is provided, comprising:

[0064] The signal obtaining unit can be connected with a beam adjustment controller of an ion implantation device, and is used to obtain the first beam from the beam adjustment controller when the ion implantation device is performing ion implantation on an integrated circuit. Stream signal, start injection signal and injection completion signal;

[0065] The processing unit is connected with the signal obtaining unit, and is used to process th...

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Abstract

The application provides a real time monitoring apparatus and a method, and is used for solving technical problems in the prior art that real time monitoring can not be carried out on the accuracy of an ion implantation dosage and the stability of a dosage controller. The apparatus comprises a signal acquisition unit and a processing unit. The signal acquisition unit can be connected with a beam adjusting controller of an ion implantation device. In a process of carrying out ion implantation on an integrated circuit by the ion implantation device, the signal acquisition unit is used for obtaining a first beam signal, a beginning injection signal and an injection completion signal from the beam adjusting controller. The processing unit is connected with the signal acquisition unit and is used for carry out processing on the first beam signal, the beginning injection signal and the injection completion signal and obtaining parameter values representing whether a dosage value injected into the integrated circuit accords with the parameter values of a preset condition.

Description

technical field [0001] The present application relates to the technical field of integrated circuit manufacturing, in particular to a real-time monitoring device and method. Background technique [0002] In the manufacture of integrated circuits, ion implantation equipment is widely used in the current domestic integrated circuit production lines. Ion implantation equipment is used for doping processes and meets the requirements of shallow junctions, low temperature and precise control. Key equipment in the process. [0003] In the prior art, the main work of ion implantation equipment: the technology of doping the area near the semiconductor surface by implanting ions, the purpose of which is to change the carrier concentration of the semiconductor to control the conductivity type of the semiconductor, while the control of the ion dose It is mainly done by the dose controller of the ion implantation equipment. [0004] It can be seen that the dose controller in the ion im...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/66H01J37/317
CPCH01J37/3171H01J37/32935
Inventor 林伟旺
Owner FOUNDER MICROELECTRONICS INT
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