Mask plate set, thin film transistor and manufacturing method, array substrate, display device
A thin film transistor and mask technology, which is applied to transistors, electro-solid devices, semiconductor devices, etc., can solve the problems of small display screen brightness, large coverage area, and low light transmittance of display devices, and achieve an increase in size value. big effect
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Embodiment 1
[0076] In Embodiment 1 of the present invention, the shape of the active layer is a regular shape, such as an isosceles trapezoid.
[0077] Preferably, the active layer is an isosceles trapezoid, the base of the isosceles trapezoid is located in a direction parallel to the data line, and the upper base of the isosceles trapezoid is located between the drain electrode and the active layer. The overlapping area of the layer, the lower base of the isosceles trapezoid is located in the overlapping area of the source electrode and the active layer; wherein the size value of the upper base and the lower base of the isosceles trapezoid conforms to the thin film transistor performance requirements.
[0078] In a specific implementation, since the active layer of the TFT is the isosceles trapezoid, the overlapping area between the drain electrode and the active layer is an isosceles trapezoid whose bottom is in a direction parallel to the data line, and The upper base of the overl...
Embodiment 2
[0110] In Embodiment 2 of the present invention, the shape of the active layer is a regular shape, for example, the shape is a simple deformation of an isosceles trapezoid, that is, a shape similar to an isosceles trapezoid.
[0111] Preferably, the shape of the active layer is similar to an isosceles trapezoid, at least one side of which is a curve.
[0112] For example, if Figure 2B As shown, one side (ie, side m) of the active layer 10B located in the overlapping area of the active layer 10B and the drain electrode 10D, and one side (ie, side m) located in the overlapping area of the active layer 10B and the source electrode 10C n) is a curve;
[0113] Such as Figure 2C As shown, two sides (ie, sides x and y) of the active layer 10B overlapping the data line 30 and the drain electrode 10D at the same time are curved lines.
[0114] It should be noted that, when the shape of the active layer is similar to an isosceles trapezoid, at least one side thereof can be not ...
Embodiment 3
[0117] In Embodiment 3 of the present invention, the shape of the active layer is a regular shape, for example, other trapezoids than the isosceles trapezoid.
[0118] For example, if Figure 2D As shown, the active layer 10B is a right-angled trapezoid, the bottom of the active layer 10B is located in a direction parallel to the data line 30, and the upper bottom of the active layer 10B is located in the overlapping area of the drain electrode 10D and the active layer 10B. The lower bottom edge of the active layer 10B is located in the overlapping region of the source electrode 10C and the active layer 10B; wherein, the size value of the upper bottom edge of the active layer 10B is z1, and the size value of the lower bottom edge of the active layer 10B is z1. z2, z1 and z2 meet the performance requirements of TFT10.
[0119] It should be noted that, similar to Embodiment 2 of the present invention, the shape of the active layer may be a shape similar to a right-angled trap...
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