Dual-frequency laser interferometer vertical measurement optical path mirror adjustment device for lithography machine
A technology of dual-frequency laser interference and optical path measurement, which is applied in the field of vertical measurement optical path mirror adjustment devices of dual-frequency laser interferometers of lithography machines, and can solve problems such as affecting measurement accuracy, lack of locking function, deformation of long strip mirrors, etc. problems, to achieve the effect of improving measurement accuracy and reducing surface error
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[0020] The implementation of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0021] A dual-frequency laser interferometer vertical measurement optical path reflector adjustment device for lithography machine, characterized in that three bosses 11 are arranged on the upper part of the reflector base 2, and the reflector 1 is bonded to the lower ends of the three bosses 11 One side of the reflector 1 connects the single spring pin 8 on the reflector 1 with the screw B9 on the reflector seat 2 through a tension spring A10, and the other side of the reflector 1 through two tension springs B7 Connect the double spring pin 5 on the reflector 1 with the two screws A6 on the reflector seat 2; install a fixed foot assembly 3 and two adjustment foot assemblies 4 on the reflector seat 2, the A fixed foot assembly 3 and two adjustment foot assemblies 4 are arranged in a triangle on the reflector base 2, and the reflector base 2 pass...
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