TFT touch screen and preparation method thereof
A technology of touch screen and liquid crystal display, which is applied in the direction of instruments, electrical digital data processing, and input/output process of data processing, etc. It can solve the adverse effects of TFT touch screen performance, TFT touch screen is difficult to meet the requirements of light and thin, and the technology is not mature, etc. question
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[0030] see figure 2 , a method for manufacturing a TFT touch screen according to an embodiment, which is used to prepare the above-mentioned TFT touch screen 100 , includes the following steps.
[0031] Step S110: providing a TFT substrate.
[0032] In order to ensure the cleanliness of the TFT substrate, a step of cleaning the TFT substrate is also included.
[0033] Preferably, the step of washing the TFT substrate includes sequentially washing with pure water and alkaline solution, and then sequentially performing two-fluid spraying, ultrapure water spraying and high-pressure spraying to ensure the cleanliness of the TFT substrate.
[0034] The lye is an alkaline detergent, such as washing powder solution, detergent solution, etc.
[0035] High-pressure spray refers to high-pressure spray ultrapure water, the pressure is preferably 1.5kg / cm 2 , to fully remove dust, oil and other pollutants on the TFT substrate without damaging the TFT substrate.
[0036] After the TFT...
Embodiment 1
[0053] Preparation of TFT touch screen
[0054] 1. Provide a TFT substrate with a surface resistance of 55 ohms / square, wash the TFT with pure water and lye in sequence, and then perform two-fluid spray, ultra-pure water spray and high-pressure spray in sequence, and finally pass through cold air and Dry with hot air, check the surface of the TFT substrate is clean, and set aside;
[0055] 2. Put the clean and dry TFT substrate on the sample holder of the magnetron sputtering chamber, and vacuum the magnetron sputtering chamber to 2.5×10 -1 Pa, and heat the TFT substrate to 120°C within 1400 seconds, and keep the TFT substrate at a constant temperature, feed oxygen and argon, and the flow rate of oxygen is 12ccm 2 , the flow rate of argon is 900ccm 2 , the running speed of the TFT substrate is 0.5m / min, the magnetron sputtering coating is started at a voltage of 300V and a power of 7500W, and the coating is 120 seconds, and the induction layer is prepared on the TFT substrat...
Embodiment 2
[0058] Preparation of TFT touch screen
[0059] 1. Provide a TFT substrate with a surface resistance of 50 ohms / square, wash the TFT with pure water and lye in sequence, and then perform two-fluid spray, ultra-pure water spray and high-pressure spray in sequence, and finally pass through cold air and Dry with hot air, check the surface of the TFT substrate is clean, and set aside;
[0060] 2. Put the clean and dry TFT substrate on the sample holder of the magnetron sputtering chamber, and vacuum the magnetron sputtering chamber to 3.50×10 -3 , and heat the TFT substrate to 100°C within 1400 seconds, and keep the temperature of the TFT substrate constant, feed oxygen and argon, and the flow rate of oxygen is 12ccm 2 , the flow rate of argon is 900ccm 2 , the running speed of the TFT substrate is 0.5m / min, the magnetron sputtering coating is started at a voltage of 350V and a power of 9000W, and the coating is 150 seconds, and the induction layer is prepared on the TFT substra...
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