Apparatus used for reaction chamber substrate heating and transmission

Abstract

The invention discloses an apparatus used for reaction chamber substrate heating and transmission. The apparatus comprises a roller transmission device arranged on the side wall of a reaction chamber, and a lifting support device arranged on the bottom of the reaction chamber; the roller transmission device comprises magnetic fluid sealed transmission devices which can only be rotated, and transmission rollers which are controlled by the magnetic fluid sealed transmission devices; the transmission rollers are used for delivering substrates via a transmission base plate; the lifting support device comprises a heating plate support frame, and a lifting cylinder used for controlling motion of the heating plate support frame; the heating plate support frame is provided with a heating plate. The apparatus used for reaction chamber substrate heating and transmission is provided with the transmission base plate, so that broken ratio of the substrates is reduced greatly, reliability is high; apparatus structure is simplified greatly, production difficulty and production cost are reduced, and application prospect is promising.

Description

technical field [0001] The invention relates to a chemical vapor deposition process reaction chamber, in particular to a substrate heating and conveying device used in the reaction chamber. Background technique [0002] In low-pressure metal-organic chemical vapor deposition, the substrate is transported into the metal gas reaction chamber by driving rollers. Since the gas reacts most strongly at a temperature of about 200°C, the substrate is placed on a heating plate for deposition during the reaction process. of. In the prior art, the process of the substrate being conveyed by rollers and placed on the heating plate is as follows: when the glass is conveyed to a predetermined position by the rollers, the thimble system located under the heating plate lifts up the substrate to leave the rollers, and the rollers The system shrinks to both sides to let go of the lower area of ​​the substrate, and then the thimble system descends to place the glass on the surface of the heati...

AI Technical Summary

Problems solved by technology

Usually the equipment provided by the equipment supplier, the spray system and the heating system are fixed on the cavity, and the process distance cannot be adjusted

Later, some manufacturers also developed some equipment with adjustable process distance, but the structure is relatively complicated, and it has not been applied in mass production machines.

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