Coating piece and preparation method thereof
A technology of coating parts and color layers, applied in the field of coating parts and their preparation, can solve the problem that plastic shells and painted shells cannot show metallic texture, etc., and achieve the effect of improving the competitiveness of appearance
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[0020] The method for preparing the coating member 10 in a preferred embodiment of the present invention includes the following steps:
[0021] See figure 2 , A vacuum coating machine 20 is provided. The vacuum coating machine 20 includes a coating chamber 21 and a vacuum pump 30 connected to the coating chamber 21. The vacuum pump 30 is used to vacuum the coating chamber 21. The coating chamber 21 is provided with a rotating frame (not shown), a chromium target 23, an aluminum target 24 and a silicon target 26. The turret drives the base material 11 to revolve along a circular track 25, and the base material 11 also rotates when revolving along the track 25.
[0022] A substrate 11 is provided, and the material of the substrate 11 is stainless steel or aluminum alloy.
[0023] The substrate 11 is subjected to surface pretreatment. The surface pretreatment may include conventional steps such as cleaning and polishing the substrate 11.
[0024] A base layer 13 is sputtered on the su...
Embodiment 1
[0030] The material of the substrate 11 used in this embodiment is stainless steel 316.
[0031] Sputtering bottom layer 13: the power of the chromium target 23 is 5kw, the argon flow is 150sccm, the temperature in the coating chamber 21 is 100°C during coating, the bias voltage applied to the substrate 11 is -250V, and the coating time is 12min.
[0032] Sputtering transition layer 15: The power of the chromium target 23 is 5kw, the flow of argon is 125sccm, the flow of acetylene is 45sccm, the temperature in the coating chamber 21 during coating is 100°C, and the bias voltage applied to the substrate 11 is -250V, The coating time is 40min.
[0033] Sputtering color layer 17: the power of the chromium target 23, the aluminum target 24 and the silicon target 26 are 4kw, 3kw and 1.5kw respectively, the flow rate of argon is 110sccm, the temperature in the coating chamber 21 is 85℃ during coating, which is applied to the substrate The bias voltage of 11 is -200V, and the coating time ...
Embodiment 2
[0036] The material of the substrate 11 used in this embodiment is aluminum alloy 6061.
[0037] Sputtering bottom layer 13: the power of the chromium target 23 is 5kw, the argon flow is 120sccm, the temperature in the coating chamber during coating is 90°C, the bias voltage applied to the substrate 11 is -300V, and the coating time is 12min.
[0038] Sputtering transition layer 15: The power of the chromium target 23 is 4kw, the flow of argon is 120sccm, the flow of acetylene is 40sccm, the temperature in the coating chamber 21 during coating is 90℃, and the bias voltage applied to the substrate 11 is -270V, The coating time is 35min.
[0039] Sputtering color layer 17: the power of the chromium target 23, the aluminum target 24 and the silicon target 26 are 3kw, 2kw and 1kw, respectively, the flow rate of argon gas is 105sccm, and the temperature in the coating chamber 21 during coating is 80℃, which is applied to the substrate 11. The bias voltage is -250V, and the coating time i...
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