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Purge sampling system and purge sampling method for gas impurity content analysis

A technology of impurity content and sampling system, which is applied in the direction of chemical instruments and methods, sampling devices, cleaning methods and appliances, etc., can solve the problems of consuming a large gas source to be tested, increasing the purging time, and increasing the analysis cost, etc. Time-sweeping, good airtightness, and the effect of reducing dosage

Active Publication Date: 2016-08-31
PERIC SPECIAL GASES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This purging method not only takes a long time and the detection speed is slow, but also consumes a large amount of gas source to be tested, which greatly increases the analysis cost
[0005] Moreover, at present, the gas source to be tested is usually connected to the sampling pipeline with a pressure reducing valve. There are two disadvantages of the pressure reducing valve: one is that the dead volume is large, and it is difficult to purge; Leakage, air is easy to infiltrate during the process of changing the air source, which further increases the purging time

Method used

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  • Purge sampling system and purge sampling method for gas impurity content analysis
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  • Purge sampling system and purge sampling method for gas impurity content analysis

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] figure 1 It is a schematic diagram of the single gas source gas supply of the gas rapid purge sampling system in this embodiment. Such as figure 1As shown, the gas rapid purge sampling system with single gas source includes sampling gas circuit, vacuum pump 1, vacuum pump switch valve 2, vacuum pressure gauge 3, gas source to be tested 4, gas source switch valve to be tested 5, gas circuit switch Valve 6, purge gas source 7, purge gas source switch valve 8, adjustable flow valve 9 and analysis instrument 10. In this embodiment, in order to prevent external air from infiltrating into the pipeline, the gas source switch valve 5 to be tested, the purge gas source switch valve 8 , the gas circuit switch valve 6 , and the vacuum pump switch valve 2 are all realized by diaphragm valves. Among them, the adjustable flow valve 9 adopts a bellows valve, thereby improving the control precision.

[0039] The connection relationship of the above components is as follows:

[0040...

Embodiment 2

[0050] The sampling and purging system in Example 1 is suitable for gas samples with a trace impurity content of ppm level (indicating that the impurity content in the gas is 10-6) or higher. For the trace impurity content is ppb level (indicates that the impurity content in the gas is 10-9) ultra-high-purity gas, then the purge gas source of the rapid purge sampling system needs to be more pure, adopt the purge sampling system of embodiment 2, in the purge A purifier 11 is added between the sweeping gas source 7 and the sweeping gas source switch valve 8 .

[0051] One option is: if figure 2 As shown, the purge gas source 7 is a gas with a purity of 5N, and the impurity content is reduced to the ppb level after being treated by the purifier 11 .

[0052] Another solution is: if figure 2 As shown, the impurity content of the gas after the gasification of the low-temperature liquefied gas with a purity of 5N is reduced to the ppb level after being treated by the purifier 11...

Embodiment 3

[0056] In this embodiment, multiple gas sources to be tested are connected to the sampling gas path, and each gas source to be tested is connected to the sampling gas path through its own switch valve of the gas source to be tested, so that the detection of multiple gas sources can be realized.

[0057] Such as image 3 It is a schematic diagram of dual gas source gas supply for a high-purity gas rapid purge sampling system with 2 gas sources to be tested. The system provides two types of cylinder connectors, which can be connected to two types of gas cylinders, such as G5 / 8-RH and W21.8-LH two types of cylinder connectors, which can be connected to cylinders of non-combustible gas and flammable gas respectively.

[0058] The workflow for detecting non-combustible gases and the workflow for detecting combustible gases are the same as steps (1)-(3) in Embodiment 1.

[0059] In this embodiment, after the detection of non-combustible gases is completed, before the detection of c...

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Abstract

The invention relates to a purging sampling system and a purging sampling method for gas impurity content analysis, belonging to the technical field of gas sampling and analysis. In the purging sampling system, the sampling gas path is connected to the analytical instrument (10), and the gas source to be tested (4) and the purge gas source (7) are respectively connected to the sampling gas path through respective switching valves, and the gas source to be tested is connected to the sampling gas path. (4) and the sampling gas path between the purge gas source (7) is provided with a gas path switch valve (6), and an adjustable flow valve (9) is set at the inlet end of the analytical instrument (10). (6) Connect the sampling gas line on the side of the gas source to be tested (4) to the vacuum pump (1), the vacuum pump (1) is connected to the sampling gas line through the vacuum pump switching valve (2), and the vacuum pump switching valve (2) and the gas line switch A vacuum pressure gauge (3) is arranged on the sampling gas path between the valves (6), and the invention can shorten the purging time, accelerate the detection speed, and reduce the consumption of the purging gas source.

Description

technical field [0001] The invention belongs to the technical field of gas sampling and analysis, in particular to a purging sampling system and a purging sampling method for gas impurity content analysis, especially suitable for detecting trace and trace impurity components of high-purity gas and ultra-high-purity gas analysis. Background technique [0002] With the rapid development of my country's optoelectronic industry, high-purity and ultra-high-purity gases are supplied as raw materials in various fields such as semiconductors, photovoltaics, optical fibers, LEDs, and LCD technologies. In the semiconductor production process, the purity of high-purity and ultra-high-purity gases has a great impact on the performance of semiconductor devices, so it is necessary to analyze the impurity content of high-purity and ultra-high-purity gases. [0003] When analyzing high-purity and ultra-high-purity gases, it is necessary to let the gas to be tested pass through the sampling...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N1/22B08B9/032B08B9/035
Inventor 刘晓林闫云李晓昆董云峰黄国庆代伟娜陈欢苏玲燕姜燕
Owner PERIC SPECIAL GASES CO LTD