Insulated Gate Right Angle Gate-Drain Composite Field Plate Power Device

A power device and insulated gate technology, applied in the field of microelectronics, can solve the problems of reducing device yield, increasing device difficulty, cumbersome process debugging, etc., to improve reliability, improve forward and reverse breakdown voltage, improve Effect of Reverse Breakdown Voltage

Active Publication Date: 2017-04-12
XIDIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the process of double-layer field plate HEMT power devices is complicated and the manufacturing cost is higher. The fabrication of each layer of field plate requires process steps such as photolithography, metal deposition, and passivation dielectric deposition.
Moreover, in order to optimize the thickness of the dielectric material under the field plates of each layer to maximize the breakdown voltage, tedious process debugging and optimization must be carried out, which greatly increases the difficulty of device manufacturing and reduces the yield of devices.

Method used

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  • Insulated Gate Right Angle Gate-Drain Composite Field Plate Power Device
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  • Insulated Gate Right Angle Gate-Drain Composite Field Plate Power Device

Examples

Experimental program
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Effect test

Embodiment 1

[0050] Embodiment 1: The production substrate is sapphire, and the insulating dielectric layer is SiO 2 , the passivation layer is Al 2 o 3 , the protective layer is SiN, the right-angle gate field plate and the right-angle drain field plate are Ti / Mo / Au metal combination insulated gate type right-angle gate-drain compound field plate power device.

[0051] Step 1. On the sapphire substrate 1, make the transition layer 2 by epitaxial GaN material from bottom to top, such as image 3 a.

[0052] An undoped transition layer 2 with a thickness of 1 μm is epitaxially formed on the sapphire substrate 1 by metal organic chemical vapor deposition technology, and the transition layer is composed of GaN materials with thicknesses of 30 nm and 0.97 μm from bottom to top. The process conditions used for the epitaxial lower layer GaN material are: temperature 530°C, pressure 45 Torr, hydrogen gas flow rate 4400 sccm, ammonia gas flow rate 4400 sccm, gallium source flow rate 22 μmol / min...

Embodiment 2

[0073] Embodiment 2: The substrate is made of silicon carbide, and the insulating dielectric layer is Al 2 o 3 , the passivation layer is SiN, the protective layer is SiO 2 , the right-angle gate field plate and the right-angle drain field plate are Ti / Ni / Au metal combination insulated gate type right-angle gate-drain composite field plate power devices.

[0074] Step 1. Epitaxially AlN and GaN materials on the silicon carbide substrate 1 to form the transition layer 2, such as image 3 a.

[0075] 1.1) Using metal-organic chemical vapor deposition technology to epitaxially undoped AlN material with a thickness of 50nm on the silicon carbide substrate 1; the process conditions for the epitaxy are: temperature is 1000°C, pressure is 45Torr, hydrogen flow rate is 4600sccm, The flow rate of ammonia gas is 4600 sccm, and the flow rate of aluminum source is 5 μmol / min;

[0076] 1.2) Using metal-organic chemical vapor deposition technology to epitaxially GaN material with a thic...

Embodiment 3

[0110] Embodiment 3: The substrate is made of silicon, and the insulating dielectric layer is HfO 2 , the passivation layer is SiO 2 , the protective layer is SiN, the right-angle gate field plate and the right-angle drain field plate are Ti / Pt / Au metal combination insulated gate type right-angle gate-drain compound field plate power device.

[0111] Step A. Epitaxial AlN and GaN materials on the silicon substrate 1 from bottom to top to make the transition layer 2, such as image 3 a.

[0112] A1) Using metal-organic chemical vapor deposition technology at a temperature of 800° C., a pressure of 40 Torr, a flow rate of hydrogen gas of 4000 sccm, a flow rate of ammonia gas of 4000 sccm, and a flow rate of aluminum source of 25 μmol / min, the epitaxy on the silicon substrate 1 AlN material with a thickness of 200nm;

[0113] A2) Using metal-organic chemical vapor deposition technology at a temperature of 980°C, a pressure of 45 Torr, a flow rate of hydrogen gas of 4000 sccm, ...

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Abstract

The invention discloses an insulated gate type power device of a right-angled gate-drain composite field plate. The insulated gate type power device comprises a substrate (1), a transition layer (2), a barrier layer (3), a source electrode (4), a schottky drain electrode (5), a table board (6), an insulated medium layer (7), an insulated gate electrode (8), a passivation layer (9) and a protective layer (14), wherein a gate slot (10) and a drain slot (11) are etched in the passivation layer; a right-angled gate field plate (12) and a right-angled drain field plate (13) are deposited between the passivation layer and the protective layer; the right-angled gate field plate is electrically connected with the insulated gate electrode, and the gate slot is completely filled in the lower end of the right-angled gate field plate; the right-angled drain field plate is electrically connected with the schottky drain electrode, and the drain slot is completely filled in the lower end of the right-angled drain field plate; the right-angled gate field plate is close to one side edge of the insulated gate electrode and aligned with one side edge, close to the insulated gate electrode, of the gate slot; the right-angled drain field plate is close to one side edge of the schottky drain electrode and aligned with one side edge, close to the schottky drain electrode, of the drain slot. The insulated gate type power device of the right-angled gate-drain composite field plate has a simple process, good positive and negative characteristics, and a high yield, and can be used as a switching device.

Description

technical field [0001] The invention belongs to the technical field of microelectronics, and relates to a semiconductor device, in particular to an insulating gate type right-angle gate-drain composite field plate power device, which can be used as a basic device of a power electronic system. [0002] technical background [0003] Power semiconductor devices are important components of power electronic systems and effective tools for power processing. In recent years, as energy and environmental issues have become increasingly prominent, research and development of new high-performance, low-loss power devices has become one of the effective ways to improve power utilization, save energy, and alleviate energy crises. However, in the research of power devices, there is a serious constraint relationship between high speed, high voltage and low on-resistance. Reasonable and effective improvement of this constraint relationship is the key to improving the overall performance of th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/778H01L29/41
CPCH01L29/402H01L29/404H01L29/66462H01L29/778H01L29/7786
Inventor 毛维郝跃范举胜李敏娜杨林安刘红侠王冲郑雪峰张金风
Owner XIDIAN UNIV
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