A kind of preparation method of visible light absorbing layer based on Ag3PO4 thin film

A technology of absorbing layer and visible light, applied in the field of photoelectric material preparation and photocatalysis, can solve the problems of difficult recovery of base photocatalyst, difficult photoelectric energy conversion, etc., and achieve the effect of low cost, easy thickness control and good adhesion.
CN104437569BInactive Publication Date: 2016-07-06CHINA UNIV OF MINING & TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
CHINA UNIV OF MINING & TECH
Publication Date
2016-07-06
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a preparation method of a visible light absorption layer based on an Ag3PO4 film, and belongs to a preparation method of photocatalysis and photoelectric materials. The visible light absorption layer is prepared by using a four-step process including coprecipitation, spin coating, drying and sintering, and the method comprises the steps of 1) preparing Ag3PO4 nano-scale ultrafine powder of which the size scale is between 20 and 500 nm by using a coprecipitation method; 2) ultrasonically dispersing the Ag3PO4 powder into transparent organic solvents, and performing spin coating on the obtained sol shaped dispersion liquid on a substrate to obtain a prefabricated Ag3PO4 film layer; and 3) putting the prefabricated Ag3PO4 film layer into an oven at the temperature of 20-80 DEG C for drying, and putting into a muffle furnace for sintering and removing organic residues. The Ag3PO4 visible light absorption layer has a thickness of 0.2-10 microns, and is high in response characteristics and adhesive force of visible light; because the visible light absorption layer is used as a photocatalyst, the visible light absorption layer is easy to recover, can be used for a photo-anode of a photoelectrochemical cell, and has a large application potential on the fields of light degradation pollutants, photolysis of water, photovoltaic conversion and the like. The method is simple, free of toxicity, easy to operate and low in cost.
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Description

Technical field

[0001] The invention relates to a method for preparing photocatalytic and photoelectric materials, in particular to a method based on Ag 3 PO 4 Method for preparing visible light absorbing layer of thin film. Background technique

[0002] Since the 1970s, environmental pollution and energy shortages have increasingly caused people to worry about the outbreak of global crises and even disasters. From the perspective of the sustainable development of human society, the development of green environmental pollution control technologies and alternative clean energy sources is urgent. Comparing all current technologies, it is found that semiconductor photocatalysis is a promising technology because it is easy to use the energy in natural light or artificial light sources. Photocatalytic materials are a type of semiconductor that can generate electrons and holes under the irradiation of light, and then can decompose water into hydrogen and oxygen, or decompose organic w...

Claims

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