Analysis methods of physical characteristics of semiconductor devices
An analysis method and a technology of physical characteristics, applied in the analysis of materials, the use of radiation for material analysis, the use of sound waves/ultrasonic waves/infrasonic waves to analyze solids, etc., can solve problems that are prone to failure, product refurbishment damage, and threats to the safety of users and other people's lives and properties And other issues
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[0020] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to specific embodiments and accompanying drawings.
[0021] The semiconductor device physical feature analysis (PFA) method is a series of analyses carried out to verify whether the identification, material, structure, chip layout and manufacturing quality of the semiconductor device comply with the regulations through a series of non-destructive analysis techniques and lossy analysis techniques. The whole process; mainly includes: external physical feature analysis technology, nondestructive structure analysis technology, acoustic scanning microscope nondestructive analysis technology, external physical feature solvent resistance test, internal process feature analysis technology; auxiliary tests include: scanning electron microscopy, energy spectrum analysis , profile analysis techniques, et...
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