A preparation method of an array substrate and a display panel thereof, and a mask plate
A technology of mask plate and substrate, which is applied in the preparation of array substrate and its display panel, mask plate field, can solve the problem of high production cost of display panel, achieve the effect of reducing product development and production cost, and reducing the number of use
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Embodiment 1
[0048] figure 1 It is a schematic structural diagram of a mask plate provided by Embodiment 1 of the present invention. Such as figure 1 As shown, the mask 101 includes a substrate, and the substrate includes a non-light-transmitting region 102 , a partially light-transmitting region 103 and a light-transmitting region 104 . The non-transparent area 102 is provided with a layer of non-transparent material, the partially transparent area 103 is provided with a layer of partially transparent material, the transparent area 104 is not provided with a light-shielding material, and the transparent area 104 is provided with within the partially transparent region 103 . During the patterning process, the transparent region 104 and the partially transparent region 103 are used to form grid lines, gates and common electrode lines, and the transparent region 104 is also used to form the first via hole and the second via hole. holes, so that the gate mask and the via hole mask can be s...
Embodiment 2
[0052] figure 2 It is a schematic structural diagram of a mask plate provided by Embodiment 2 of the present invention. Such as figure 2 As shown, the mask 101 includes a substrate, and the substrate includes a non-light-transmitting region 102 , a partially light-transmitting region 103 and a light-transmitting region 104 . The non-transparent area 102 is provided with a layer of non-transparent material, the partially transparent area 103 is provided with a layer of partially transparent material, the transparent area 104 is not provided with a light-shielding material, and the non-transparent area 102 It is arranged in the partially light-transmitting region 103 . During the patterning process, the non-transparent region 102 and the partially transparent region 103 are used to form gate lines, gates and common electrode lines, and the non-transparent region 102 is also used to form the first via hole and the second via hole. Two via holes, so that the gate mask and the...
Embodiment 3
[0056] In this embodiment, the preparation process of the array substrate is described in detail as follows. It should be noted that the array substrate described in this embodiment is in TN mode, but array substrates in other modes, for example, the preparation methods of array substrates in ADS mode and VA mode also belong to the protection scope of the present invention.
[0057] image 3 It is a flowchart of a method for preparing an array substrate provided in Embodiment 3 of the present invention. Such as image 3 Shown, described preparation method comprises:
[0058] Step 3001, forming a gate metal thin film on a substrate.
[0059] Step 3002, using a mask plate to form gate lines and gates through a patterning process.
[0060] In this embodiment, the mask plate is the mask plate provided in the first embodiment above, and the specific content can refer to the description in the first embodiment above, and will not be repeated here.
[0061] Figure 4a ~ Figure ...
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