A kind of preparation method of fs-igbt
A silicon chip and backside technology, which is applied in the field of power semiconductor devices, can solve the problems of silicon chip warpage, difficulty, and low yield rate, and achieve the effects of reduced forward conduction voltage, small turn-off loss, and low yield rate
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[0038] The principles and characteristics of the present invention will be further explained below in conjunction with the accompanying drawings. The examples cited are only used to explain the present invention, not to limit the scope of the present invention.
[0039] Such as Image 6 As shown, the implementation of the present invention provides a method for preparing an FS-IGBT with a thin drift region on a thick silicon wafer, including:
[0040] Step 1: Choose two N-type monocrystalline silicon wafers as the first silicon wafer and the second silicon wafer. The thickness of the first silicon wafer is 300 microns, lightly doped N-type FZ silicon is used, and the doping concentration is 2.5* 10 14 Pcs / cm 3 To form Figure 5 The drift zone 3 of the FS-IGBT described in the second silicon wafer has a thickness of 300 microns and uses heavily doped N-type CZ silicon with a doping concentration of 5*10 19 Pcs / cm 3 To form Figure 5 The back of the FS-IGBT described in N + Zone 11, s...
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