Optoelectronic device and method for its manufacture
A technology of optoelectronic devices and quantum membranes, which is applied to electrical components, semiconductor devices, circuits, etc., and can solve the problems of quantum membranes with reduced efficiency
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[0047] figure 1 A schematic diagram of a section through a part of the layer structure 100 is shown. Layer structure 100 is an epitaxially grown semiconductor layer structure. In particular, the layer structure 100 can consist of a III-nitride material system. The layer structure 100 can be used in optoelectronic components, in particular in light-emitting diodes.
[0048] Along the epitaxial growth direction 101 , an n-doped crystal 110 , an optically active layer 200 and a p-doped crystal 120 are located successively in the layer structure 100 . The layer structure 100 can be set in figure 1 on a substrate not shown. of the substrate and layer structure 100 in the figure 1 Other layers can also be arranged between the parts shown in . Further layers can also be arranged between the layers 110 , 200 , 120 of the layer structure 100 .
[0049] The optically active layer 200 has a plurality of quantum films which follow one another in the growth direction 101 and are eac...
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