Gravity compensation device
A technology of gravity compensation and piston, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problem of large horizontal stiffness and achieve the effect of low stiffness
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[0023] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that all the drawings of the present invention are in simplified form and use inaccurate scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0024] Such as Figure 1~2 As shown, the gravity compensation device provided by the present invention is used to support the micro-movement stage of the workpiece stage and the mask stage in the lithography machine, including: a base 100, a piston 200, a sheath 300, a pendulum mechanism 500, an airbag structure 600 and a load Plate 400; wherein, the base 100 is provided with an air chamber 110 for supporting the piston 200 at the top of the air chamber 110; the sheath 300 is sleeved on the piston 200 a...
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Abstract
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