Lithographic alignment mark structure and manufacturing method thereof
A technology of lithography alignment and manufacturing method, which is applied in microlithography exposure equipment, optics, photoplate making process of pattern surface, etc., which can solve the limitation of layout design and publication, poor alignment, and doubts about vector fitting and other problems to achieve the effect of solving the lack of cutting space, reducing errors and high-order parts, and avoiding unpredictability
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[0048] In order to make the purpose and features of the present invention more obvious and easy to understand, the following will further describe the specific embodiments of the present invention in conjunction with the accompanying drawings. However, the present invention can be realized in different forms, and should not be considered as being limited to the described embodiments . It should be noted that the relative arrangements of components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless specifically stated otherwise. At the same time, it should be understood that, for the convenience of description, the sizes of the various parts shown in the drawings are not drawn according to the actual proportional relationship. The following description of at least one exemplary embodiment is merely illustrative in nature and in no way taken as limiting the invention, its application or us...
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