Method and device for monitoring etching solution
A technology of etching potion and monitoring information, which is applied in the direction of program control, electrical program control, comprehensive factory control, etc. It can solve the problem that the etching addition system does not have a visual display of the real-time status of the system, the stability adjustment of the control system, and the inability to etch and add system stability feedback And other issues
Active Publication Date: 2018-12-11
UNIVERSAL P C B EQUIP SHENZHEN
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[0004] The purpose of the embodiments of the present invention is to provide an etching solution monitoring method, which aims to solve the problem that the existing etching addition system does not directly display the real-time status of the system operation, cannot provide feedback on the stability of the etching addition system operation, and the user cannot operate according to the system. The real-time status of the real-time status, the problem of adjusting the stability of the control system operation
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[0021] In order to make the objectives, technical solutions, and advantages of the present invention clearer, the following further describes the present invention in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.
[0022] figure 1 It is an implementation flowchart of an etching solution monitoring method provided by an embodiment of the present invention, and the details are as follows:
[0023] In step S101, monitoring information during the adding process of the etching solution is acquired, where the monitoring information includes process parameters;
[0024] Among them, the main control board of etching addition control sends an acquisition request for acquiring monitoring information during the etching potion addition process to the lower computer, so that after receiving the acquisition request, the...
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The invention is applied to the field of an etching liquid medicine monitoring technology, and provides an etching liquid medicine monitoring method and apparatus. The method comprises the following steps: obtaining monitoring information in an etching liquid medicine adding process, the monitoring information comprising technical parameters; and extracting the technical parameters from the monitoring information, and according to the technical parameters, generating monitoring files in preset formats, wherein the technical parameters comprise one from or a combination of the following values: a proportion current value, a hydrochloric acid current value, an oxidizing agent current value, a proportion upper limit value, a hydrochloric acid upper limit value, an oxidizing agent upper limit value, a proportion target value, a hydrochloric acid target value, an oxidizing agent target value, a proportion lower limit value, a hydrochloric acid lower limit value and an oxidizing agent lower limit value. According to the invention, the operation real-time state of a system can be visually displayed, a timely-feedback of the operation stability of an etching adding system can be given, and a subsequent user can adjust the operation stability of a control system according to the operation real-time state of the system and stored historical parameters.
Description
Technical field [0001] The invention belongs to the technical field of etching liquid monitoring, and in particular relates to an etching liquid monitoring method and device. Background technique [0002] On the printed circuit board production line, etching solutions are usually used to etch the printed circuit board. At present, the etching potion addition system on the market generally uses multiple independent potion analyzers to analyze the etching potion and add sub-liquid to keep the potion active, so as to meet the quality requirements of circuit board manufacturers for automated circuit board production. [0003] However, the etching addition system does not visually display the real-time status of the system operation, and thus cannot provide feedback on the stability of the etching addition system operation, so that the user cannot adjust the stability of the control system operation according to the real-time status of the system operation. Summary of the invention [0...
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IPC IPC(8): G05B19/418
CPCG05B19/41865
Inventor 陈德和
Owner UNIVERSAL P C B EQUIP SHENZHEN