Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for producing film formation mask

A manufacturing method and mask technology, applied in chemical instruments and methods, vacuum evaporation plating, coating and other directions, can solve the problems of metal part fracture, wrinkling, opening pattern deformation, etc., and achieve the effect of improving the accuracy of the forming position

Active Publication Date: 2015-11-11
V TECH CO LTD
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a problem that, depending on the manner in which the tension is applied to the metal sheet, wrinkling, deflection, or breakage of the metal portion between adjacent opening patterns occurs in the metal sheet, or the formed opening pattern is deformed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for producing film formation mask
  • Method for producing film formation mask
  • Method for producing film formation mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] Embodiments of the present invention will be described in detail below based on the drawings. figure 1 The embodiment showing the method of manufacturing the film-forming mask of the present invention is a cross-sectional view showing the step of joining the mask sheet to the frame. The film-forming mask manufacturing method manufactures a film-forming mask having a structure in which a mask sheet formed with a plurality of opening patterns is tensioned and fixed to a frame-shaped metal frame, and the following steps are performed: In the first step, a certain Bond the peripheral portion of the mask sheet on the net of the synthetic fiber of tension; the 2nd step, the part of the net corresponding to the film-forming effective area of ​​the size containing a plurality of opening patterns in the mask sheet is cut off; the 3rd step, in The peripheral portion of the mask sheet is joined to fix the frame from the side opposite to the mesh; and in a fourth step, the mesh is...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention is a method for producing a film formation mask having such a structure that a metal mask sheet (4) having multiple opening patterns formed thereon is stretched and fixed onto a frame-like metal frame (7), said method comprising: a first step of adhering the peripheral part of the metal mask sheet (4) to a mesh (1) which is made from a synthetic fiber and to which a certain tensile force is applied; a second step of cutting and removing a portion of the mesh (1) which corresponds to a film formation effective area that has a size enough to cover the multiple opening patterns formed on the metal mask sheet (4); a third step of bonding and fixing the frame (7) to the peripheral part of the metal mask sheet (4) from the opposite side of the mesh (1); and a fourth step of removing the mesh (1) from the metal mask sheet (4).

Description

technical field [0001] The present invention relates to a method of manufacturing a film-forming mask in which a mask sheet having a plurality of opening patterns is stretched and fixed to a frame-shaped metal frame, and in particular relates to a mask sheet capable of imparting uniformity to the entire surface of the mask sheet. A method of manufacturing a film-forming mask tensionally secured to a frame. Background technique [0002] In the conventional method of manufacturing a film formation mask, a metal sheet is etched using a resist mask to form a plurality of penetrating opening patterns, and spot welding is performed on the peripheral edge of the metal sheet while the metal sheet is stretched. A frame-shaped metal frame (for example, refer to Patent Document 1). [0003] prior art literature [0004] patent documents [0005] Patent Document 1: JP-A-2009-074160 Contents of the invention [0006] The problem to be solved by the invention [0007] However,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04
CPCC23C14/042B32B15/00B32B38/10B32B2310/0843
Inventor 斋藤雄二工藤修二小菅崇之水村通伸
Owner V TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products