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Substrate liquid processing device and substrate liquid processing method

A technology of liquid treatment and liquid treatment, which is applied in the field of substrate liquid treatment devices, can solve the problems of reduced treatment efficiency and achieve the effect of improving treatment efficiency

Active Publication Date: 2018-11-13
ZEUS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Accordingly, a large number of particles are generated in the substrate liquid processing apparatus, and the processing efficiency is reduced due to the change in the concentration of the processing liquid.

Method used

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  • Substrate liquid processing device and substrate liquid processing method
  • Substrate liquid processing device and substrate liquid processing method
  • Substrate liquid processing device and substrate liquid processing method

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Embodiment Construction

[0042] Hereinafter, embodiments of the present invention will be specifically described with reference to the drawings. The substrate liquid processing apparatus of the present invention can be divided into the first to fifth embodiments, and the constituent elements of each embodiment are basically the same, but there are differences in some configurations. In addition, the same reference numerals are used for components that have the same functions and actions in the plurality of embodiments of the invention.

[0043] The substrate liquid processing apparatus according to the first embodiment of the present invention is as figure 1 As shown in the figure, it is roughly divided into a substrate support unit 10 , a rotational drive unit 20 , a processing liquid supply unit 30 , a heating unit 40 , a processing liquid recovery unit 50 , and a water supply unit 60 .

[0044] The substrate support unit 10 supports the substrate W in isolation from the upper part of the table 11 ...

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Abstract

The invention relates to a substrate liquid processing device used for etching and cleaning a substrate used for a semiconductor. The substrate liquid processing device comprises a substrate support portion which supports the substrate in a mode of isolating the substrate from the upper portion of a table, a rotation driving portion driving a rotating shaft used for rotating the table, a processing liquid supplying portion supplying a processing liquid used for processing a processing surface of the substrate, a heating portion heating the substrate or the processing liquid or both of them, a processing liquid recovering portion arranged around the table and recovering the processing liquid discharged from the substrate and a water supplying portion supplying space which provides the processing liquid with water. Accordingly, in high-temperature processing technology, the concentration of the processing liquid can be uniformly maintained and the processing liquid selection ratio can be raised.

Description

technical field [0001] The present invention relates to a substrate liquid processing device for etching and cleaning semiconductor substrates. Background technique [0002] In order to manufacture semiconductor devices, etching and cleaning processes are necessary when forming multilayer thin films on substrates. [0003] In general, wet etching and cleaning equipment performs etching, cleaning, and drying processes by rotating a table provided with chucks that support substrates, and supplies processing liquids to the substrates, and recovers them by using a processing liquid recovery unit equipped with a cup structure around the table. treatment fluid. [0004] In addition, in order to quickly remove thin films such as nitride films, oxide films, and metal films or photoresists evaporated on the substrate, it is necessary to perform the process at a high temperature. [0005] As described above, when the treatment liquid is supplied at a high temperature, the water cont...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/02
CPCH01L21/02H01L21/67023H01L21/6708H01L21/6715H01L21/67051
Inventor 赵允仙金瀚沃鲁圣德金康元
Owner ZEUS