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Layered transparent conductive oxide thin films

A technology of oxide film and conductive oxide, which is applied in coating, gaseous chemical plating, metal material coating process, etc., can solve the problems of increasing process complexity, and achieve the elimination of Si growth problem, enhanced haze, low The effect of manufacturing costs

Inactive Publication Date: 2016-03-16
CORNING INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

These paths add additional process complexity in addition to cost in the case of polishing

Method used

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  • Layered transparent conductive oxide thin films
  • Layered transparent conductive oxide thin films
  • Layered transparent conductive oxide thin films

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Embodiment Construction

[0022] Reference will now be made in detail to one or more presently preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or like parts.

[0023] As used herein, the term "substrate" can be used to describe either a substrate or a superstrate, depending on the photovoltaic cell configuration. For example, a substrate is a top plate if the substrate is on the light incident side of the photovoltaic cell when assembled to the photovoltaic cell. The overhead plate may be protected from impact and environmental degradation by photovoltaic material while allowing transmission of the appropriate wavelengths of the solar spectrum. Additionally, a plurality of photovoltaic cells may be arranged into a photovoltaic module. Photovoltaic devices can be described as cells, modules, or both.

[0024] Where numerical ranges are recited...

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Abstract

Transparent conductive oxide thin films having a plurality of layers with voids located at each interface. Smooth TCO surfaces with no post growth processing and a largely tunable haze value. Methods of making include applying multiple layers of a conductive oxide onto a surface of a substrate, and interrupting the application between the multiple layers to form a plurality of voids at the interfaces.

Description

[0001] Cross References to Related Applications [0002] This application claims priority under 35 U.S.C. §119 to U.S. Provisional Application Serial No. 61 / 774874, filed March 8, 2013, upon which this application relies and which is incorporated by reference in its entirety Incorporated into this article. technical field [0003] The present disclosure relates to transparent conductive oxide (TCO) films, and more particularly, to layered TCO films that can be used in, for example, photovoltaic devices. Background technique [0004] The current state of the art for enhancing haze in Si tandem systems is based on surface engineering methods to texture either the TCO surface and / or the glass surface prior to TCO deposition. By forming large faceted surface features on the TCO, incident light will be geometrically scattered into the underlying semiconductor. This leads to increased light trapping, which overcomes the poor absorption coefficient in Si. Since TCO growth is con...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/00C03C17/34
CPCC03C17/007C03C17/2453C03C2217/241C03C2217/45C03C2217/211C03C17/245C03C17/3417C03C2217/94C03C2218/1525C03C2218/30C03C2218/345C23C16/40C23C16/453C23C16/52
Inventor 加布里埃尔·P·阿格尼欧因德雷杰特·杜塔杰安-弗朗索瓦·奥达弟
Owner CORNING INC
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