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Substrate treating apparatus and substrate treating methods

A substrate processing device and substrate technology, applied in the direction of measuring devices, optical device exploration, optical devices, etc., can solve problems such as damage and damage to the substrate, and achieve the effect of preventing substrate damage

Active Publication Date: 2016-04-06
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Use the hand of the substrate transport mechanism to carry out the substrate to the outside of the carrier. If the substrate is not held in the correct position in the carrier, the hand will interfere with the substrate in the carrier and contact the surface of the substrate to cause damage or Risk of damage to substrate

Method used

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  • Substrate treating apparatus and substrate treating methods
  • Substrate treating apparatus and substrate treating methods
  • Substrate treating apparatus and substrate treating methods

Examples

Experimental program
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Embodiment Construction

[0035] Hereinafter, Embodiment 1 of the present invention will be described with reference to the drawings. Figure 1A Is a side view showing the schematic configuration of the substrate processing apparatus of Example 1, Figure 1B It is a side view of the cover attaching and detaching part. Figure 1C It is a side view of the surveying and mapping department. Figure 2A~Figure 2C It is a diagram showing an example of a conveyor. image 3 It is a top view showing two sets of surveying and mapping sensors.

[0036] Refer to Figure 1A . The substrate processing apparatus 1 includes an indexing section 2 and a processing section 3 that performs predetermined processing on the substrate W. The processing section 3 can perform various substrate processing, and has one or more processing units for performing, for example, resist coating processing, development processing, cleaning processing, and heat treatment.

[0037] The indexing section 2 has a mounting table 4 on which a carrier C ...

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PUM

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Abstract

The present invention provides a substrate treating apparatus and substrate treating methods which can prevent damage to substrates. In a state of mapping sensors having been advanced into a carrier by a sensor advance / withdraw mover, a sensor lifting and lowering device moves the mapping sensors up and down. With this movement, the mapping sensors detect presence or absence of substrates in a horizontal direction crossing a fore-and-aft direction in which the substrates are moved into and out of the carrier, and a height sensor detects heights of the mapping sensors. Consequently, substrate heights are detected in two different locations in the fore-and-aft direction. Based on the substrate heights, a substrate condition acquiring unit acquires a tilt of each substrate relative to the horizontal in the fore-and-aft direction. The tilt of each substrate inside the carrier is acquired in advance, thereby to be able to prevent substrate damage due to contact between a hand of a substrate transport mechanism and the substrates.

Description

Technical field [0001] The present invention relates to a substrate processing apparatus and a substrate processing method for processing substrates such as semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for photomasks, and substrates for optical discs. Background technique [0002] The substrate processing apparatus has: a mounting table for mounting a conveyor (container), a processing unit that performs predetermined processing on the substrate, a substrate transport mechanism provided between the mounting table and the processing unit, and the conveyor (container) In ), a plurality of substrates (wafers) are stacked and housed in the up-down direction at intervals. The substrate transport mechanism has a hand that holds the substrate, takes out the substrate from the transporter and transports the substrate to the processing section, and transports the substrate from the processing section to the transporter and accommodates th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/677
CPCH01L21/67265H01L21/67766H01L21/67259H01L21/67778B25J11/0095G01B11/26G01B11/0608G01V8/20
Inventor 桥本光治波多野章人林豊秀土谷庆一
Owner DAINIPPON SCREEN MTG CO LTD