Two-dimensional plane simulation space pattern achieving method

A technology of two-dimensional plane and realization method, which is applied in the field of anti-counterfeiting marks and packaging materials, can solve the problems of no optical colorfulness, loss of anti-counterfeiting marks, small viewing angle, etc., and achieve the effect of being easy to be copied and improving anti-counterfeiting security

Inactive Publication Date: 2016-05-04
成都亚波长微纳科技研究院
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Most of the existing simulated three-dimensional crystal pattern technologies use printing or holographic technology, so that observers can see the brightness and darkness of different areas when viewing from different angles to present a three-dimensional effect, and the problem of small viewing angles of holographic graphics cannot be avoided
It is opaque, has a small viewing angle, can only be observed through reflection, has a poor three-dimensional effect, and does not have the optical and colorful effects of real crystals.
[0003] The principle of this method is simple, the raw materials are common and there is no confidentiality, the production process and equipment requirements are low, and it can be easily imitated, thus losing the function of the anti-counterfeiting mark itself

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Two-dimensional plane simulation space pattern achieving method
  • Two-dimensional plane simulation space pattern achieving method
  • Two-dimensional plane simulation space pattern achieving method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] All features disclosed in this specification, or steps in all methods or processes disclosed, may be combined in any manner, except for mutually exclusive features and / or steps.

[0027] Any feature disclosed in this specification (including any appended claims, abstract and drawings), unless expressly stated otherwise, may be replaced by alternative features which are equivalent or serve a similar purpose. That is, unless expressly stated otherwise, each feature is one example only of a series of equivalent or similar features.

[0028] The specific implementation manners of the present invention will be described in detail below in conjunction with the drawings and embodiments.

[0029] Such as Figure 1 to Figure 3 As shown, according to an embodiment of the present invention, this embodiment discloses a method for realizing a two-dimensional plane simulation three-dimensional pattern, first drawing a predetermined two-dimensional plane pattern, and then dividing th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a two-dimensional plane simulation space pattern achieving method. The method comprises the following steps that 1, a preset two-dimensional plane pattern is drawn through mapping software; 2, the two-dimensional plane pattern is divided into patch units with different optical effects; 3, round Fresnel lenses with different optical parameters and structures are obtained through programming software according to the number and structures of the patch units; 4, Boolean operation is carried out on the patch units and the round Fresnel lenses at different positions, and Fresnel lenses with different optical parameters are obtained; 5, the Fresnel lenses are spliced to form a new preset two-dimensional pattern. The round Fresnel lenses with different parameters and structures are utilized for modulating light paths, 360-degree observation without dead angles is achieved, and colorful visual effects represented by reflection, refraction, diffraction, interference and the like of light in a multi-section cut crystal are restored more truly.

Description

technical field [0001] The invention relates to an anti-counterfeiting mark and packaging material, in particular to a method for realizing a two-dimensional plane simulation three-dimensional pattern. Background technique [0002] Most of the existing simulated three-dimensional crystal pattern technologies use printing or holographic technology, so that observers can see the brightness and darkness of different areas when viewing from different angles to present a three-dimensional effect, and the problem of small viewing angles of holographic graphics cannot be avoided. And it is opaque, the observation angle is small, and it can only be observed through reflection, the three-dimensional effect is poor, and there is no optical colorful effect displayed by real crystals. [0003] The principle of this method is simple, the raw materials are common and there is no confidentiality, the production process and equipment requirements are low, and it can be easily imitated, thus...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/22
CPCG02B30/40
Inventor 赵容宇宋捷
Owner 成都亚波长微纳科技研究院
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap