Preparation method of a flexible single-layer nano-thin film memristor
A nano-film and memristor technology, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve problems such as commercial production, complicated manufacturing process, and inability to carry out hardware experiments
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[0145] Using the same preparation method of single-layer nano-film memristor, using pulsed laser deposition PLD or magnetron sputtering method to plate electrodes with Au, Ag, and Pt, the preparation method includes the following steps:
[0146] Step 1, with Ba (Ti 1-y X y )O 3-y (X=Mg, Zn, Ca) was used as the target material, and the LTCC green ceramic tape pre-coated with the lower electrode Pt or Au was coated by pulsed laser deposition PLD or magnetron sputtering to form a resistive layer. The thickness of the coating is 10-990nm, then heat treatment at 700-900℃ for 10-30 minutes;
[0147] The second step is to use the target material of Au, Ag or Pt, using the pulsed laser method or the magnetron sputtering method, in the Ba (Ti 1-y X y )O 3-y A layer of top electrode is plated on the nano film.
[0148] 4. Example 22 adopts the same Ba(Ti 1-y X y )O 3-y The mixture target has the same raw material formula; and a layer of upper electrode is plated with an In-Ga e...
Embodiment 1
[0155] Preparation of Ba(Ti 1-y X y )O 3-y The raw material formula of the mixture target is: Ba(CH 3 COO) 2 :C 16 H 36 O 4 Ti: X (CH 3 COO) 2 =100:99:1 (molar ratio).
Embodiment 2
[0157] Preparation of Ba(Ti 1-y X y )O 3-y The raw material formula of the mixture target is: Ba(CH 3 COO) 2 :C 16 H 36 O 4 Ti: X (CH 3 COO) 2 =100:98:2 (molar ratio).
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