Position determining device and method, lithographic printing apparatus, and article manufacturing method
A technology for determining devices and lithography, applied in the direction of photolithography, instruments, optics, etc. on the patterned surface, can solve the problems of frequent measurement of relative positions, etc.
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no. 1 example
[0022] figure 1 is a front view of the alignment device (position determination device) 100 according to the first embodiment of the present invention. figure 1 A state in which the substrate 10 is transferred to the stage 120 is shown. The alignment device 100 detects the position of the substrate 10 before transferring the substrate 10 to an apparatus for performing processing thereon, and aligns the substrate 10 with a predetermined standby position based on the detection result. Hereinafter, the alignment instruction aligns the substrate 10 with a predetermined position with respect to a translation direction and a rotation direction.
[0023] The stage 120 includes a rotary stage (rotation unit) 121 for rotating the substrate 10 by using the z-axis direction as its rotation axis, an XY stage 122 for translationally moving the substrate 10 in the XY plane, and a supporting The supporting part 123 of the substrate 10 .
[0024] A substrate not having a cutout portion suc...
no. 2 example
[0055] In the alignment apparatus 100 according to the second embodiment, as distance information on the distance from the edge 12 in the substrate 10 to the mark 11, the distance from the edge 12 to the mark 11 or the signal width corresponding thereto is stored in the memory 134 . Other configurations are basically the same as those in the alignment device 100 according to the first embodiment.
[0056] Figure 6 The relationship between the light-receiving waveform 140 and the substrate 10 when the mark 11 exists in the field of view of the light-receiving element 110 is shown. When the foreign particles 20 are attached on the rear surface of the substrate 10 , light reflected from the foreign particles 20 is also represented in the light-receiving waveform 140 . When the signal strength corresponding to the light reflected from the foreign particle 20 exceeds the threshold 145 , the controller 130 may mistake it for light reflected from the marker 11 . This embodiment i...
no. 3 example
[0060] If the light receiving element 110 picks up an image with the first light source 111 and the second light source 112 kept illuminated while the substrate 10 is rotated, blurring of the image of the mark 11 or the image of the edge 12 may occur depending on the rotation speed. If the image becomes blurred, in the light-receiving waveform 140, the waveform in the portion corresponding to the edge 12 becomes disturbed, the half-value width of the peak waveform corresponding to the mark 11 increases, or other similar phenomena occur. This reduces the accuracy of position detection of the edge 12 or mark 11 .
[0061] To solve this problem, in the alignment apparatus 100 according to the third embodiment, the controller 131 sets the lighting interval of the first light source 111 , and the controller 132 sets the lighting interval of the second light source 112 . Other configurations are basically the same as in the alignment apparatus 100 in the first embodiment, and the su...
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