Calibration method for large-area optical profilometry based on dual-wavefront interference fringe array
A technology of interference fringe and contour measurement, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of increased cost, inability to measure, and inability to obtain very thin fringes, so as to reduce the number of calibrations and achieve simple and efficient measurement Calibration effect
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[0029] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0030] Such as figure 1 As shown, it is a schematic flowchart of the large-area optical profilometry calibration method based on the double-wavefront interference fringe array of the present invention. A calibration method for large-area optical profilometry based on a double-wavefront interference fringe array, comprising the following steps:
[0031] A. Obtain the double-wavefront interference fringe array image modulated by the optical profile of the object to be measured, and construct a calibration model according to the mapping relationship between the calibration plate image coordinate syst...
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