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Photomask set and manufacturing method thereof, photomask and display device manufacturing method

A manufacturing method and photomask technology, which are applied in the field of photomasks, can solve the problem that it is difficult to manufacture high-precision display devices, etc., and achieve the effect of stable yield

Active Publication Date: 2019-12-27
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0023] Therefore, the inventors of the present application have paid attention to the following problem: in the manufacturing process of a photomask having a light-shielding portion, a light-transmitting portion, and a semi-transmitting portion, if the first patterning step and the second patterning step are applied as described in Patent Document 1, 2 patterning process (including drawing process respectively), it is difficult to manufacture a high-precision display device

Method used

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  • Photomask set and manufacturing method thereof, photomask and display device manufacturing method
  • Photomask set and manufacturing method thereof, photomask and display device manufacturing method
  • Photomask set and manufacturing method thereof, photomask and display device manufacturing method

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Embodiment Construction

[0069] Conventional photomasks such as the photomask described in Patent Document 1 are manufactured through the following steps. Figure 10 The manufacturing process of the conventional photomask is shown.

[0070] exist Figure 10 In the manufacturing process of the conventional photomask shown, first, a mask blank ( Figure 10 (a)). Next, a resist material is applied on the light-shielding film 4a to form a first resist film 23a ( Figure 10 (b)). Next, pattern exposure is performed on the translucent film and the light-shielding film. Next, the first resist film 23a is developed to form a first resist pattern 23b ( Figure 10 (c)). Next, the transparent film 3a and light shielding film 4a exposed from the first resist pattern 23b are etched to form a semitransparent film pattern 3b and a light shielding film intermediate pattern 4b ( Figure 10 (d)). Next, the remaining first resist pattern 23b is removed ( Figure 10 (e)). Next, a resist material is applied to f...

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Abstract

The present invention provides a photomask, a photomask module, a photomask, and display device manufacturing method. A display device with more fine and higher integration can steadily perform production in good yield. The photomask with patterns for transferring is provided. The patterns for transferring are formed by designing the semi-transparent light film and a light shield film on a transparent substrate. The patterns for transferring include a transmitting portion, a shading portion, a semi-transparent portion and a semi-transparent edge portion. The transparent portion is adjacent to the semi-transparent edge portion with the width of W ([Mu]m), and the semi-transparent edge portion is adjacent to the shading portion, and the W is larger than 0 and not less than 0.3.

Description

technical field [0001] The present invention relates to a photomask excellent in positional accuracy of a pattern. In particular, it relates to a method for producing a photomask, a photomask set, and a method for producing a display device using the photomask, which can be advantageously used as a photomask for producing a display device. Background technique [0002] It is known to use a pattern forming method that reduces photolithography steps by using a photomask with three or more gradations in the manufacture of a display device. [0003] For example, Patent Document 1 describes a gradation mask for display device manufacture used in the manufacture of a display device. On this gradation mask for display device manufacture, a transparent substrate, a light-shielding film, and a transparent substrate are laminated in different order. A translucent film with a rate adjustment function, and has the following areas: a light-shielding area, which is an area where the ligh...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/32G03F1/56
CPCG03F1/32G03F1/56
Inventor 山口昇
Owner HOYA CORP
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