A high-performance asymmetric metal oxide-based micro-supercapacitor and its preparation method
A supercapacitor, oxide-based technology, applied in the manufacture of hybrid/electric double layer capacitors, hybrid capacitor electrodes, etc., can solve the problems of poor matching of positive and negative electrode materials, low coulombic efficiency of devices, and low electrode utilization , to achieve the effect of enhancing pseudocapacitive capacity, improving Coulombic efficiency benefits, and increasing energy and power density
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0027] It has a high-performance asymmetric metal oxide-based micro-supercapacitor, which includes the following steps:
[0028] 1) Coat the photoresist 9000A on the silicon wafer substrate with a coater at a speed of 4000rpm, spin coating for 40s, and then bake the glue with a hot plate at 100°C for 15min;
[0029] 2) Fabricate an interdigitated structure with a width of 100 microns by photolithography;
[0030] 3) Physical Vapor Deposition (PVD): Use a thermal evaporation coater to vaporize the metal electrode Cr / Ni (10nm / 100nm);
[0031] 4) After heating the acetone to 50°C and keeping it warm for 15 minutes, put the device in it and let it stand for 1 hour to peel off all the interfingers, then rinse the substrate with acetone and isopropanol, and dry it with nitrogen;
[0032] 5) Apply silver paste to the positive and negative poles of the current collector respectively, be careful not to connect them, and let them stand for 6 hours at room temperature and ventilation; ...
Embodiment 2
[0039] It has a high-performance asymmetric metal oxide-based micro-supercapacitor, which includes the following steps:
[0040] 1) Coat the photoresist 9000A on the silicon wafer substrate with a coater at a speed of 4000rpm, spin coating for 40s, and then bake the glue with a hot plate at 100°C for 15min;
[0041] 2) Fabricate an interdigitated structure with a width of 100 microns by photolithography;
[0042] 3) Physical Vapor Deposition (PVD): Use a thermal evaporation coater to vaporize the metal electrode Cr / Ni (10nm / 100nm);
[0043] 4) After heating the acetone to 50°C and keeping it warm for 15 minutes, put the device in it and let it stand for 1 hour to peel off all the interfingers, then rinse the substrate with acetone and isopropanol, and dry it with nitrogen;
[0044] 5) Apply silver paste to the positive and negative poles of the current collector respectively, be careful not to connect them, and let them stand for 6 hours at room temperature and ventilation; ...
Embodiment 3
[0051] It has a high-performance asymmetric metal oxide-based micro-supercapacitor, which includes the following steps:
[0052] 1) Coat the photoresist 9000A on the silicon wafer substrate with a coater at a speed of 4000rpm, spin coating for 40s, and then bake the glue with a hot plate at 100°C for 15min;
[0053] 2) Fabricate an interdigitated structure with a width of 100 microns by photolithography;
[0054] 3) Physical Vapor Deposition (PVD): Use a thermal evaporation coater to vaporize the metal electrode Cr / Ni (10nm / 100nm);
[0055] 4) After heating the acetone to 50°C and keeping it warm for 15 minutes, put the device in it and let it stand for 1 hour to peel off all the interfingers, then rinse the substrate with acetone and isopropanol, and dry it with nitrogen;
[0056] 5) Apply silver paste to the positive and negative poles of the current collector respectively, be careful not to connect them, and let them stand for 6 hours at room temperature and ventilation; ...
PUM
Property | Measurement | Unit |
---|---|---|
width | aaaaa | aaaaa |
volume ratio | aaaaa | aaaaa |
volume ratio | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com